Hydrophobicity of Rare Earth Oxides Grown by Atomic Layer Deposition
Oh, Il-Kwon, Kim, Kangsik, Lee, Zonghoon, Ko, Kyung Yong, Lee, Chang-Wan, Lee, Su Jeong, Myung, Jae Min, Lansalot-Matras, Clement, Noh, Wontae, Dussarrat, Christian, Kim, Hyungjun, Lee, Han-Bo-Ram
Published in Chemistry of materials (13.01.2015)
Published in Chemistry of materials (13.01.2015)
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The effect of La2O3-incorporation in HfO2 dielectrics on Ge substrate by atomic layer deposition
Oh, Il-kwon, Kim, Min-Kyu, Lee, Jae-seung, Lee, Chang-Wan, Lansalot-Matras, Clement, Noh, Wontae, Park, Jusang, Noori, Atif, Thompson, David, Chu, Schubert, Maeng, W.J., Kim, Hyungjun
Published in Applied surface science (15.12.2013)
Published in Applied surface science (15.12.2013)
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Atomic layer deposition of Y2O3 and yttrium-doped HfO2 using a newly synthesized Y(iPrCp)2(N-iPr-amd) precursor for a high permittivity gate dielectric
Lee, Jae-Seung, Kim, Woo-Hee, Oh, Il-Kwon, Kim, Min-Kyu, Lee, Gyeongho, Lee, Chang-Wan, Park, Jusang, Lansalot-Matras, Clement, Noh, Wontae, Kim, Hyungjun
Published in Applied surface science (01.04.2014)
Published in Applied surface science (01.04.2014)
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Atomic layer deposition of lanthanum oxide with heteroleptic cyclopentadienyl-amidinate lanthanum precursor - Effect of the oxygen source on the film growth and properties
Seppälä, Sanni, Niinistö, Jaakko, Mattinen, Miika, Mizohata, Kenichiro, Räisänen, Jyrki, Noh, Wontae, Ritala, Mikko, Leskelä, Markku
Published in Thin solid films (30.08.2018)
Published in Thin solid films (30.08.2018)
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Heteroleptic Cyclopentadienyl-Amidinate Precursors for Atomic Layer Deposition (ALD) of Y, Pr, Gd, and Dy Oxide Thin Films
Seppälä, Sanni, Niinistö, Jaakko, Blanquart, Timothee, Kaipio, Mikko, Mizohata, Kenichiro, Räisänen, Jyrki, Lansalot-Matras, Clement, Noh, Wontae, Ritala, Mikko, Leskelä, Markku
Published in Chemistry of materials (09.08.2016)
Published in Chemistry of materials (09.08.2016)
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Comparison of the Atomic Layer Deposition of Tantalum Oxide Thin Films Using Ta(N t Bu)(NEt2)3, Ta(N t Bu)(NEt2)2Cp, and H2O
Song, Seul Ji, Park, Taehyung, Yoon, Kyung Jean, Yoon, Jung Ho, Kwon, Dae Eun, Noh, Wontae, Lansalot-Matras, Clement, Gatineau, Satoko, Lee, Han-Koo, Gautam, Sanjeev, Cho, Deok-Yong, Lee, Sang Woon, Hwang, Cheol Seong
Published in ACS applied materials & interfaces (11.01.2017)
Published in ACS applied materials & interfaces (11.01.2017)
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High growth-rate atomic layer deposition process of cerium oxide thin film for solid oxide fuel cell
Yu, Jin-Geun, Yang, Byung Chan, Shin, Jeong Woo, Lee, Sungje, Oh, Seongkook, Choi, Jae-Ho, Jeong, Jaehack, Noh, Wontae, An, Jihwan
Published in Ceramics international (15.02.2019)
Published in Ceramics international (15.02.2019)
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Effects of Cl-Based Ligand Structures on Atomic Layer Deposited HfO2
Park, Bo-Eun, Oh, Il-Kwon, Lee, Chang Wan, Lee, Gyeongho, Shin, Young-Han, Lansalot-Matras, Clement, Noh, Wontae, Kim, Hyungjun, Lee, Han-Bo-Ram
Published in Journal of physical chemistry. C (24.03.2016)
Published in Journal of physical chemistry. C (24.03.2016)
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