Method for forming a porous dielectric material layer in a semiconductor device and device formed
HEDRICK JEFFREY CURTIS, RODBELL KENNETH PARKER, NITTA, SATYANARANA, V, ROSENBERG ROBERT, DALTON TIMOTHY JOSEPH, GRECO STEPHEN EDWARD, PURUSHOTHAMAN SAMPATH
Year of Publication 30.10.2006
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Year of Publication 30.10.2006
Patent