Search Results - "NINOMIYA MASAHARU" :: K.UTB vyhledávací portál

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SEMICONDUCTOR SUBSTRATE, FIELD-EFFECT TRANSISTOR, AND THEIR PRODUCTION METHODS

by SHIONO, ICHIRO, KOUGAMI, HAZUMU, NINOMIYA,MASAHARU
Year of Publication 02.03.2011

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METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE AND METHOD FOR FABRICATING FIELD EFFECT TRANSISTOR AND SEMICONDUCTOR SUBSTRATE AND FIELD EFFECT TRANSISTOR

by NINOMIYA, MASAHARU, SHIONO, ICHIRO, KOUGAMI, HAZUMU
Year of Publication 02.12.2009

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EPITAXIAL SILICON SINGLE CRYSTAL WAFER AND METHOD OF MANUFACTURING THE SAME

by NINOMIYA MASAHARU, TSUYA HIDEKI
Year of Publication 25.07.2003

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Method of manufacturing semiconductor wafer by forming a strain relaxation SiGe layer on an insulating layer of SOI wafer

by Matsumoto, Koji, Hora, Tomoyuki, Endo, Akihiko, Morita, Etsurou, Ninomiya, Masaharu
Year of Publication 07.02.2012

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Method of manufacturing semiconductor wafer by forming a strain relaxation SiGe layer on an insulating layer of SOI wafer

by ENDO AKIHIKO, MATSUMOTO KOJI, NINOMIYA MASAHARU, HORA TOMOYUKI, MORITA ETSUROU
Year of Publication 07.02.2012

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MANUFACTURE OF SEMICONDUCTOR SUBSTRATE

by NINOMIYA MASAHARU
Year of Publication 09.10.1992

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MANUFACTURE OF SEMICONDUCTOR SUBSTRATE

by NINOMIYA MASAHARU
Year of Publication 02.09.1992

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EVALUATING METHOD OF PARTICLE ON SEMICONDUCTOR SUBSTRATE

by NINOMIYA MASAHARU
Year of Publication 04.12.1991

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Method for producing strained Si-SOI substrate and strained Si-SOI substrate produced by the same

by MATSUMOTO KOJI, NINOMIYA MASAHARU, MIYAO MASANOBU, NAKAMAE MASAHIKO
Year of Publication 12.07.2011

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Method for producing strained Si-SOI substrate and strained Si-SOI substrate produced by the same

by Ninomiya, Masaharu, Matsumoto, Koji, Nakamae, Masahiko, Miyao, Masanobu
Year of Publication 12.07.2011

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DEVICE FOR HOLDING SEMICONDUCTOR WAFER

by NINOMIYA MASAHARU
Year of Publication 26.09.1989

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Semiconductor substrate and field-effect transistor, and manufacturing method for same

by Shiono, Ichiro, Ninomiya, Masaharu, Kougami, Hazumu
Year of Publication 29.07.2008

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Semiconductor substrate and field-effect transistor, and manufacturing method for same

by NINOMIYA MASAHARU, SHIONO ICHIRO, KOUGAMI HAZUMU
Year of Publication 29.07.2008

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POSITIONING OF WAFER DIRECTION AND DEVICE THEREFOR

by NINOMIYA MASAHARU
Year of Publication 19.10.1988

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Silicon epitaxial wafer manufacturing method

by FUJIKAWA TAKASHI, NINOMIYA MASAHARU
Year of Publication 17.07.2001

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APERTURE MASK FOR CHARGED BEAM RESTRICTION

by NINOMIYA MASAHARU
Year of Publication 08.04.1987

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Characterization of mirror-polished silicon wafers by Makyoh method

by Tokura, Seitaro, Fujino, Nobukatsu, Ninomiya, Masaharu, Masuda, Kenji
Published in Journal of crystal growth (01.06.1990)

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Journal Article Conference Proceeding

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ORIENTATION DEVICE OF WAFER

by NINOMIYA MASAHARU
Year of Publication 03.03.1986

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Patent

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ELECTRONIC LENS OF ELECTRON BEAM EXPOSURE DEVICE AND THE LIKE

by NINOMIYA MASAHARU
Year of Publication 04.12.1985

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Method for manufacturing semiconductor wafer including a strained silicon layer

by Ninomiya, Masaharu, Matsumoto, Koji, Nakamae, Masahiko, Miyao, Masanobu, Sadoh, Taizoh
Year of Publication 03.08.2010

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