Mask etch plasma reactor having an array of optical sensors viewing the workpiece backside and a tunable element controlled in response to the optical sensors
PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 22.12.2015
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Year of Publication 22.12.2015
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Process for etching a transparent workpiece including backside endpoint detection steps
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 06.09.2011
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Year of Publication 06.09.2011
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Mask etch plasma reactor with cathode providing a uniform distribution of etch rate
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 23.08.2011
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Year of Publication 23.08.2011
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Plasma reactor for processing a workpiece and having a tunable cathode
Lewington, Richard, Grimbergen, Michael N, Nguyen, Khiem K, Bivens, Darin, Chandrachood, Madhavi R, Kumar, Ajay
Year of Publication 28.06.2011
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Year of Publication 28.06.2011
Patent
Plasma reactor for processing a workpiece and having a tunable cathode
BIVENS DARIN, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 28.06.2011
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Year of Publication 28.06.2011
Patent
Plasma mask etch method of controlling a reactor tunable element in accordance with the output of an array of optical sensors viewing the mask backside
PANAYIL SHEEBA J, IBRAHIM IBRAHIM M, KUMAR AJAY, GRIMBERGEN MICHAEL N, LEWINGTON RICHARD, NGUYEN KHIEM K, CHANDRACHOOD MADHAVI R
Year of Publication 13.09.2011
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Year of Publication 13.09.2011
Patent