Search Results - "NEISIUS; KARL-HEINZ" :: K.UTB vyhledávací portál

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PROCESS FOR STRIPPING PHOTORESIST AND STRIPPING RESTS FROM SEMICONDUCTOR SURFACES

by LITTERS, ALOIS, NEISIUS, KARL-HEINZ
Year of Publication 05.06.1991

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NEGATIVE PHOTORESIST FORMULATIONS WITH RADIATION-ABSORBING ADDITIVES

by NEISIUS, KARL HEINZ, HAAS, GUENTHER
Year of Publication 13.05.1988

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NEGATIV ARBEITENDE FOTORESISTZUSAMMENSETZUNGEN MIT STRAHLUNGSABSORBIERENDEN ZUSAETZEN

by NEISIUS, KARL HEINZ, HAAS, GUENTHER
Year of Publication 15.06.1987

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NEGATIVE PHOTORESIST FORMULATIONS WITH RADIATION-ABSORBING ADDITIVES

by NEISIUS, KARL HEINZ, HAAS, GUNTHER
Year of Publication 20.05.1987

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POSITIVE PHOTORESIST COMPOSITION

by NEISIUS, KARL HEINZ, HAAS, GUNTHER
Year of Publication 06.05.1987

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AGENT AND PROCESS FOR STRIPPING PHOTORESIST AND STRIPPING RESTS FROM SEMICONDUCTOR SURFACES

by LITTERS, ALOIS, NEISIUS, KARL-HEINZ
Year of Publication 29.10.1986

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MITTEL UND VERFAHREN ZUR ENTFERNUNG VON FOTORESIST- UND STRIPPERRESTEN VON HALBLEITERSUBSTRATEN

by HEINZ,.NEISIUS,KARL, LITTERS,ALOIS
Year of Publication 24.07.1986

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BISARIDO COMPOUNDS, LIGHT-SENSITIVE COMPOSITIONS CONTAINING THEM AND PROCESS FOR OBTAINING RELIEF IMAGES

by NEISIUS, KARL HEINZ, HAAS, GUNTHER
Year of Publication 29.01.1986

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CH601916

by WILHELM BAEUMER, KARL HEINZ NEISIUS
Year of Publication 14.07.1978

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Method for stripping photolacquers

by NEISIUS; KARL HEINZ, BAUMER; WILHELM
Year of Publication 24.01.1978

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LIGHT-SENSITIVE COMPOUNDS FOR POSITIVE PHOTORESIST MATERIALS

by NEISIUS, KARL HEINZ, HAAS, GUNTHER, STEIN, ALFRED
Year of Publication 05.12.1984

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NEUE GEMISCHE AUF BASIS VON AROMATISCHALIPHATISCHEN KETONEN, IHRE VERWENDUNG ALS PHOTOINITIATOREN SOWIE PHOTOPOLYMERISIERBARE SYSTEME ENTHALTEND SOLCHE GEMISCHE

by NEISIUS, KARL-HEINZ, EICHLER, JUERGEN, HERZ, CLAUS
Year of Publication 15.06.1984

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MIXTURES BASED ON AROMATIC-ALIPHATIC KETONES, THEIR USE AS PHOTOINITIATORS AND PHOTOPOLYMERISABLE SYSTEMS CONTAINING SUCH MIXTURES

by NEISIUS, KARL-HEINZ, EICHLER, JURGEN, HERZ, CLAUS
Year of Publication 06.06.1984

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Mixtures of aromatic-aliphatic ketones as photoinitiators and photopolymerizable systems containing them

by NEISIUS; KARL-HEINZ, EICHLER; JUERGEN, HERZ; CLAUS
Year of Publication 28.02.1984

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Mixtures of aromatic-aliphatic ketones as photoinitiators and photopolymerizable systems containing them

by NEISIUS; KARL-HEINZ, EICHLER; JUERGEN, HERZ; CLAUS
Year of Publication 28.06.1983

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FOTOLACKE ZUR AUSBILDUNG VON RELIEFSTRUKTUREN AUS HOCHWAERMEBESTAENDIGEN POLYMEREN

by HAERTNER, HARTMUT, NEISIUS, KARL HEINZ, KLUG, RUDOLF, MERREM, HANS-JOACHIM
Year of Publication 15.02.1987

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PHOTORESIST FOR CREATING RELIEF STRUCTURES ON HIGH-TEMPERATURE RESISTANT POLYMERS

by NEISIUS, KARL HEINZ, KLUG, RUDOLF, HARTNER, HARTMUT, MERREM, HANS-JOACHIM
Year of Publication 04.02.1987

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AROMATISCH-ALIPHATISCHE KETONE UND IHRE VERWENDUNG ALS PHOTOINITIATOREN

by NEISIUS, KARL-HEINZ, EICHLER, JUERGEN, HERZ, CLAUS, WEHNER, GREGOR
Year of Publication 28.02.1985

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Aromatic-aliphatic ketones useful as photoinitiators

by WEHNER; GREGOR, NEISIUS; KARL-HEINZ, EICHLER; JUERGEN, HERZ; CLAUS
Year of Publication 29.01.1985

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NEGATIV ARBEITENDE FOTORESISTZUSAMMENSETZUNGEN MIT STRAHLUNGSABSORBIERENDEN ZUSAETZEN

by HAAS,GUENTHER,.DR, HEINZ,.NEISIUS,KARL
Year of Publication 17.01.1985

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