Method for manufacturing substrate for inspecting semiconductor device
KOUNO RYUJI, ARIGA AKIHIKO, HOSOGANE ATSUSHI, TANAKA SHINJI, ENDOU YOSHIHIGE, BAN NAOTO, OHTA HIROYUKI, KANAMARU MASATOSHI, AOKI HIDEYUKI, MIURA HIDEO
Year of Publication 20.05.2003
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Year of Publication 20.05.2003
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Method for manufacturing substrate for inspecting semiconductor device
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Year of Publication 20.05.2003
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Year of Publication 20.05.2003
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MANUFACTURE OF SEMICONDUCTOR DEVICE AND JIG FOR INSPECTION
KONO RYUJI, OTA HIROYUKI, ARIGA AKIHIKO, HOSOGANE ATSUSHI, ENDO KIJU, BAN NAOTO, KANAMARU MASATOSHI, MIURA HIDEO
Year of Publication 12.01.2001
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Year of Publication 12.01.2001
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DEVICE AND METHOD FOR INSPECTING SEMICONDUCTOR DEVICE, SEMICONDUCTOR DEVICE, AND MANUFACTURE THEREOF
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Year of Publication 29.09.2000
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Year of Publication 29.09.2000
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SEMICONDUCTOR ELEMENT INSPECTING SUBSTRATE AND INSPECTING METHOD
KONO RYUJI, ARIGA AKIHIKO, HOSOGANE ATSUSHI, TANAKA SHINJI, ENDO KIJU, BAN NAOTO, KANAMARU MASATOSHI, AOKI HIDEYUKI
Year of Publication 14.09.2000
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Year of Publication 14.09.2000
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Semiconductor device manufacturing method
Ariga, Akihiko, Kono, Ryuji, Aoki, Hideyuki, Ohta, Hiroyuki, Endo, Yoshishige, Kanamaru, Masatoshi, Hosogane, Atsushi, Tanaka, Shinji, Ban, Naoto, Miura, Hideo
Year of Publication 06.02.2003
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Year of Publication 06.02.2003
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Semiconductor device manufacturing method
KONO RYUJI, ENDO YOSHISHIGE, ARIGA AKIHIKO, HOSOGANE ATSUSHI, TANAKA SHINJI, BAN NAOTO, OHTA HIROYUKI, AOKI HIDEYUKI, KANAMARU MASATOSHI, MIURA HIDEO
Year of Publication 06.02.2003
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Year of Publication 06.02.2003
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METHOD AND DEVICE FOR INSPECTING SEMICONDUCTOR ELEMENT
KONO RYUJI, KITANO MAKOTO, OTA HIROYUKI, ARIGA AKIHIKO, BAN NAOTO, MOTOYAMA YASUHIRO, AOKI HIDEYUKI, MIURA HIDEO
Year of Publication 30.06.2000
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Year of Publication 30.06.2000
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MANUFACTURE OF SEMICONDUCTOR INSPECTION DEVICE
KONO RYUJI, ARIGA AKIHIKO, HOSOGANE ATSUSHI, ENDO KIJU, BAN NAOTO, KANAMARU MASATOSHI, AOKI HIDEYUKI
Year of Publication 23.06.2000
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Year of Publication 23.06.2000
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Semiconductor device manufacturing method
Kono, Ryuji, Ariga, Akihiko, Aoki, Hideyuki, Ohta, Hiroyuki, Endo, Yoshishige, Kanamaru, Masatoshi, Hosogane, Atsushi, Tanaka, Shinji, Ban, Naoto, Miura, Hideo
Year of Publication 12.11.2002
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Year of Publication 12.11.2002
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Semiconductor device manufacturing method
KONO RYUJI, ENDO YOSHISHIGE, ARIGA AKIHIKO, HOSOGANE ATSUSHI, TANAKA SHINJI, BAN NAOTO, OHTA HIROYUKI, AOKI HIDEYUKI, KANAMARU MASATOSHI, MIURA HIDEO
Year of Publication 12.11.2002
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Year of Publication 12.11.2002
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Connecting apparatus, method of fabricating wiring film with holder, inspection system and method of fabricating semiconductor element
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Year of Publication 10.05.2000
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Year of Publication 10.05.2000
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SEMICONDUCTOR DEVICE MANUFACTURING METHOD
KONO RYUJI, ENDO YOSHISHIGE, ARIGA AKIHIKO, HOSOGANE ATSUSHI, TANAKA SHINJI, BAN NAOTO, OHTA HIROYUKI, KANAMARU MASATOSHI, AOKI HIDEYUKI, MIURA HIDEO
Year of Publication 30.05.2002
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Year of Publication 30.05.2002
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SEMICONDUCTOR DEVICE MANUFACTURING METHOD
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Year of Publication 30.05.2002
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Year of Publication 30.05.2002
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Semiconductor device and manufacturing method thereof including a probe test step and a burn-in test step
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Year of Publication 30.10.2003
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Year of Publication 30.10.2003
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Semiconductor device and manufacturing method thereof including a probe test step and a burn-in test step
MORI TERUTAKA, KITANO MAKOTO, SHIBUYA SHUJI, KOHNO RYUJI, ARIGA AKIHIKO, SHIGI HIDETAKA, KASUKABE SUSUMU, WADA YUJI, BAN NAOTO, MOTOYAMA YASUHIRO, MATSUMOTO KUNIO, KUMAZAWA TETSUO, WATANABE TAKAYOSHI
Year of Publication 30.10.2003
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Year of Publication 30.10.2003
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