Analytical Model for Redistribution Profile of Ion-Implanted Impurities During Solid-Phase Epitaxy
Suzuki, Kunihiro, Kataoka, Yuji, Nagayama, Susumu, Magee, Charles W., Buyuklimanli, Temel H., Nagayama, Tsutomu
Published in IEEE transactions on electron devices (01.02.2007)
Published in IEEE transactions on electron devices (01.02.2007)
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Journal Article
Design of a Broadband Carpet Cloak for Hiding Larger Objects than the Wavelength by Using One-Dimensional Meander Microstrip-Line Structures
Sonoda, Yuki, Nagayama, Tsutomu, Watanabe, Toshio, Fukushima, Seiji
Published in 2022 Asia-Pacific Microwave Conference (APMC) (29.11.2022)
Published in 2022 Asia-Pacific Microwave Conference (APMC) (29.11.2022)
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Conference Proceeding
Cluster Ion Implantation System: Claris for Beyond 45nm Device Fabrication (Ii)
Tanjyo, Masayasu, Hamamoto, Nariaki, Nagayama, Tsutomu, Umisedo, Sei, Koga, Yuji, Maehara, Noriaki, Une, Hideyasu, Matsumoto, Takao, Nagai, Nobuo, Borland, John O.
Published in ECS transactions (06.03.2009)
Published in ECS transactions (06.03.2009)
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Journal Article
The exceptional advantages of channeling implantation into 4H-SiC to make abrupt deep profiles
Wada, Ryota, Nagayama, Tsutomu, Tokoro, Nobuhiro, Kuroi, Takashi, Das, Hrishikesh, Sunkari, Swapna, Justice, Joshua
Published in Japanese Journal of Applied Physics (01.05.2022)
Published in Japanese Journal of Applied Physics (01.05.2022)
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Journal Article
Nested Mach-Zehnder interferometer optical switch with phase generating couplers
Tasaki, Kohei, Tokumaru, Mitsuru, Watanabe, Toshio, Nagayama, Tsutomu, Fukushima, Seiji
Published in Japanese Journal of Applied Physics (01.08.2020)
Published in Japanese Journal of Applied Physics (01.08.2020)
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Journal Article
The diffusion analysis of implanted heavy metals in 4H-SiC
Wada, Ryota, Hamamoto, Nariaki, Nagayama, Tsutomu, Kuroi, Takashi
Published in MRS advances (15.12.2022)
Published in MRS advances (15.12.2022)
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Journal Article
Design Method for Broadband Invisible Cloaks by Using Straight and Meander Transmission-Lines
Nagayama, Tsutomu
Published in 2022 IEEE International RF and Microwave Conference (RFM) (19.12.2022)
Published in 2022 IEEE International RF and Microwave Conference (RFM) (19.12.2022)
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Conference Proceeding
High dose dopant implantation to heated Si substrate without amorphous layer formation
Onoda, Hiroshi, Nakashima, Yoshiki, Nagayama, Tsutomu, Sakai, Shigeki
Published in 2013 13th International Workshop on Junction Technology (IWJT) (01.06.2013)
Published in 2013 13th International Workshop on Junction Technology (IWJT) (01.06.2013)
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Conference Proceeding
A novel approach for highly activated p+ diffusion layer formation in germanium by pre-heating oxygen desorption before ion implantation
Igo, Tetsuya, Higuchi, Takahiro, Nagayama, Tsutomu, Kuroi, Takashi, Hamamoto, Nariaki, Tanimura, Hideaki, Kawarazaki, Hikaru, Aoyama, Takayuki, Kato, Shinichi, Kobayashi, Ippei
Published in 2017 17th International Workshop on Junction Technology (IWJT) (01.06.2017)
Published in 2017 17th International Workshop on Junction Technology (IWJT) (01.06.2017)
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Conference Proceeding