Recent EUV Resists toward High Volume Manufacturing
Nakagawa, Hisashi, Naruoka, Takehiko, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
Novel EUV Photoresist for Sub-7 nm Node
Suzuki, Junya, Furukawa, Tsuyoshi, Miyata, Hiromu, Shiratani, Motohiro, Naruoka, Takehiko, Maruyama, Ken, Nakagawa, Hiroki, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2017)
Published in Journal of Photopolymer Science and Technology (01.01.2017)
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Journal Article
Novel High Sensitivity EUV Photoresist for Sub-7 nm Node
Nagai, Tomoki, Nakagawa, Hisashi, Naruoka, Takehiko, Dei, Satoshi, Tagawa, Seiichi, Oshima, Akihiro, Nagahara, Seiji, Shiraishi, Gosuke, Yoshihara, Kosuke, Terashita, Yuichi, Minekawa, Yukie, Buitrago, Elizabeth, Ekinci, Yasin, Yildirim, Oktay, Meeuwissen, Marieke, Hoefnagels, Rik, Rispens, Gijsbert, Verspaget, Coen, Maas, Raymond
Published in Journal of Photopolymer Science and Technology (01.01.2016)
Published in Journal of Photopolymer Science and Technology (01.01.2016)
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Journal Article
Directed Self Assembly Materials for Semiconductor Lithography
Minegishi, Shinya, Naruoka, Takehiko, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Toward the Design of a Sequential Two Photon Photoacid Generator for Double Exposure Photolithography
O’Connor, Naphtali A, Berro, Adam J, Lancaster, Jeffrey R, Gu, Xinyu, Jockusch, Steffen, Nagai, Tomoki, Ogata, Toshiyuki, Lee, Saul, Zimmerman, Paul, Willson, C. Grant, Turro, Nicholas J
Published in Chemistry of materials (23.12.2008)
Published in Chemistry of materials (23.12.2008)
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Journal Article
Novel EUV Resist Development for Sub-14nm Half Pitch
Kimoto, Takakazu, Naruoka, Takehiko, Nakagawa, Hisashi, Fujisawa, Tomohisa, Shiratani, Motohiro, Nagai, Tomoki, Ayothi, Ramakrishnan, Hishiro, Yoshi, Hori, Masafumi, Hoshiko, Kenji, Kimura, Toru
Published in Journal of Photopolymer Science and Technology (01.01.2015)
Published in Journal of Photopolymer Science and Technology (01.01.2015)
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Journal Article
Directed Self Assembly Materials for Hole Patterning
Minegishi, Shinya, Anno, Yusuke, Namie, Yuji, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2012)
Published in Journal of Photopolymer Science and Technology (01.01.2012)
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Journal Article
Novel EUV Resists Materials for 16nm HP and beyond
Sakai, Kazunori, Shiratani, Motohiro, Fujisawa, Tomohisa, Inukai, Koji, Sakai, Kaori, Maruyama, Ken, Hoshiko, Kenji, Ayothi, Ramakrishnan, Santos, Andreia, Naruoka, Takehiko, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
Directed Self Assembly Material Development for Fine Patterning and Pattern Repair
Minegishi, Shinya, Namie, Yuji, Izumi, Kenichi, Anno, Yusuke, Buch, Xavier, Naruoka, Takehiko, Hishiro, Yoshi, Nagai, Tomoki
Published in Journal of Photopolymer Science and Technology (01.01.2013)
Published in Journal of Photopolymer Science and Technology (01.01.2013)
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Journal Article
Self-Consistent Field Theory of Directed Self-Assembly on CH Pitch Division
Tominaga, Tetsuo, Minegishi, Shinya, Komatsu, Hiroyuki, Naruoka, Takehiro, Nagai, Tomoki, Izumi, Kenichi, Fredrickson, Glenn H.
Published in Journal of Photopolymer Science and Technology (01.01.2014)
Published in Journal of Photopolymer Science and Technology (01.01.2014)
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Journal Article
Stereoretentive Elimination and Trans-olefination of the Dicationic Dipalladium Moiety [Pd2L n ]2+ Bound on 1,3,5-Trienes
Murahashi, Tetsuro, Nakashima, Hiromitsu, Nagai, Tomoki, Mino, Yukari, Okuno, Taketoshi, Jalil, M. Abdul, Kurosawa, Hideo
Published in Journal of the American Chemical Society (05.04.2006)
Published in Journal of the American Chemical Society (05.04.2006)
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Journal Article
Preparation of water-dispersible Janus nanosheets from K4Nb6O17·3H2O and their behaviour as a two-dimensional surfactant on air–water and water-toluene interfaces
Suzuki, Ryoko, Nagai, Tomoki, Onitsuka, Emika, Idota, Naokazu, Kunitake, Masashi, Nishimi, Taisei, Sugahara, Yoshiyuki
Published in Dalton transactions : an international journal of inorganic chemistry (07.03.2022)
Published in Dalton transactions : an international journal of inorganic chemistry (07.03.2022)
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