Molecular dynamics simulation of silicon oxidation enhanced by energetic hydrogen ion irradiation
Mizotani, Kohei, Isobe, Michiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi
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Published in Journal of physics. D, Applied physics (22.04.2015)
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Characterization of polymer layer formation during SiO2/SiN etching by fluoro/hydrofluorocarbon plasmas
Miyake, Keita, Ito, Tomoko, Isobe, Michiro, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi
Published in Japanese Journal of Applied Physics (01.03.2014)
Published in Japanese Journal of Applied Physics (01.03.2014)
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Enhanced etching of tin-doped indium oxide due to surface modification by hydrogen ion injection
Li, Hu, Karahashi, Kazuhiro, Friederich, Pascal, Fink, Karin, Fukasawa, Masanaga, Hirata, Akiko, Nagahata, Kazunori, Tatsumi, Tetsuya, Wenzel, Wolfgang, Hamaguchi, Satoshi
Published in Japanese Journal of Applied Physics (01.06.2018)
Published in Japanese Journal of Applied Physics (01.06.2018)
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Prediction of Fluctuations in Plasma–Wall Interactions Using an Equipment Engineering System
Fukasawa, Masanaga, Kawashima, Atsushi, Kuboi, Nobuyuki, Takagi, Hitoshi, Tanaka, Yasuhito, Sakayori, Hiroyuki, Oshima, Keiji, Nagahata, Kazunori, Tatsumi, Tetsuya
Published in Japanese Journal of Applied Physics (01.08.2009)
Published in Japanese Journal of Applied Physics (01.08.2009)
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Wavelength Dependence of Photon-Induced Interface Defects in Hydrogenated Silicon Nitride/Si Structure during Plasma Etching Processes
Fukasawa, Masanaga, Matsugai, Hiroyasu, Honda, Takahiro, Miyawaki, Yudai, Kondo, Yusuke, Takeda, Keigo, Kondo, Hiroki, Ishikawa, Kenji, Sekine, Makoto, Nagahata, Kazunori, Uesawa, Fumikatsu, Hori, Masaru, Tatsumi, Tetsuya
Published in Japanese Journal of Applied Physics (01.05.2013)
Published in Japanese Journal of Applied Physics (01.05.2013)
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Analysis of Plasma Wall Reactions Using Virtual Optical Emission Spectrometry Signal during Dielectric Etching
Kuboi, Nobuyuki, Fukasawa, Masanaga, Kawashima, Atsushi, Oshima, Keiji, Nagahata, Kazunori, Tatsumi, Tetsuya
Published in Japanese Journal of Applied Physics (01.08.2010)
Published in Japanese Journal of Applied Physics (01.08.2010)
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Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H2/Ar plasma
Hirata, Akiko, Fukasawa, Masanaga, Shigetoshi, Takushi, Okamoto, Masaki, Nagahata, Kazunori, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Tatsumi, Tetsuya
Published in Japanese Journal of Applied Physics (01.06.2017)
Published in Japanese Journal of Applied Physics (01.06.2017)
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METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND FILM FORMING DEVICE
SHIRATANI MASAHARU, KAMATAKI KUNIHIRO, MIZOKAMI YUYA, NAGAHATA KAZUNORI, TABUCHI KIYOTAKA, MIYATA YUJI
Year of Publication 20.01.2023
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Year of Publication 20.01.2023
Patent
Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H 2 /Ar plasma
Hirata, Akiko, Fukasawa, Masanaga, Shigetoshi, Takushi, Okamoto, Masaki, Nagahata, Kazunori, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Tatsumi, Tetsuya
Published in Japanese Journal of Applied Physics (01.06.2017)
Published in Japanese Journal of Applied Physics (01.06.2017)
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Journal Article
METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE AND FILM FORMING DEVICE
MIYATA Yuji, NAGAHATA Kazunori, TABUCHI Kiyotaka, MIZOKAMI Yuya, KAMATAKI Kunihiro, SHIRATANI Masaharu
Year of Publication 12.01.2023
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Year of Publication 12.01.2023
Patent
Effects of hydrogen-damaged layer on tin-doped indium oxide etching by H^sub 2^/Ar plasma
Hirata, Akiko, Fukasawa, Masanaga, Shigetoshi, Takushi, Okamoto, Masaki, Nagahata, Kazunori, Li, Hu, Karahashi, Kazuhiro, Hamaguchi, Satoshi, Tatsumi, Tetsuya
Published in Japanese Journal of Applied Physics (01.06.2017)
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Published in Japanese Journal of Applied Physics (01.06.2017)
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Twenty-four-micrometer-pitch microelectrode array with 6912-channel readout at 12 kHz via highly scalable implementation for high-spatial-resolution mapping of action potentials
Ogi, Jun, Kato, Yuri, Matoba, Yoshihisa, Yamane, Chigusa, Nagahata, Kazunori, Nakashima, Yusaku, Kishimoto, Takuya, Hashimoto, Shigeki, Maari, Koichi, Oike, Yusuke, Ezaki, Takayuki
Published in Biointerphases (01.12.2017)
Published in Biointerphases (01.12.2017)
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Journal Article
Characterization of polymer layer formation during SiO 2 /SiN etching by fluoro/hydrofluorocarbon plasmas
Miyake, Keita, Ito, Tomoko, Isobe, Michiro, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi
Published in Japanese Journal of Applied Physics (01.03.2014)
Published in Japanese Journal of Applied Physics (01.03.2014)
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Journal Article
Characterization of polymer layer formation during SiO sub(2)/SiN etching by fluoro/hydrofluorocarbon plasmas
Miyake, Keita, Ito, Tomoko, Isobe, Michiro, Karahashi, Kazuhiro, Fukasawa, Masanaga, Nagahata, Kazunori, Tatsumi, Tetsuya, Hamaguchi, Satoshi
Published in Japanese Journal of Applied Physics (01.01.2014)
Published in Japanese Journal of Applied Physics (01.01.2014)
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