Thin SiO2/a-Si:H/SiO2 multilayer insulators obtained by electron cyclotron resonance chemical vapor deposition at room temperature for possible application in non-volatile memories
Mateos, D., Diniz, J.A., Nedev, N., Munoz, S.N.M., Curiel, M., Mederos, M., Valdez, B., Montero, G.
Published in Thin solid films (30.04.2017)
Published in Thin solid films (30.04.2017)
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