The amorphous range in sputtered Si–Al–Sn films
Hatchard, T.D., Dahn, J.R., Trussler, S., Fleischauer, M., Bonakdarpour, A., Mueller-Neuhaus, J.R., Hewitt, K.C.
Published in Thin solid films (22.10.2003)
Published in Thin solid films (22.10.2003)
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