A holistic characterization methodology for stochastic printing failures in EUV contact holes
Church, Jennifer, Austin, Brad, Meli, Luciana, Varghese, Alex Joseph, Esposito, Teresa A., Moon, DukKyun, Mowell, Nathaniel, Levitov, Felix, Smolyan, Uri, Baum, Omri, Yabbo, Paz
Published in 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (10.05.2021)
Published in 2021 32nd Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) (10.05.2021)
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