A Novel Aldo-Keto Reductase, HdRed, from the Pacific Abalone Haliotis discus hannai, Which Reduces Alginate-derived 4-Deoxy-l-erythro-5-hexoseulose Uronic Acid to 2-Keto-3-deoxy-d-gluconate
Mochizuki, Shogo, Nishiyama, Ryuji, Inoue, Akira, Ojima, Takao
Published in The Journal of biological chemistry (25.12.2015)
Published in The Journal of biological chemistry (25.12.2015)
Get full text
Journal Article
High-precision deformation mapping in finFET transistors with two nanometre spatial resolution by precession electron diffraction
Cooper, David, Bernier, Nicolas, Rouvière, Jean-Luc, Wang, Yun-Yu, Weng, Weihao, Madan, Anita, Mochizuki, Shogo, Jagannathan, Hemanth
Published in Applied physics letters (29.05.2017)
Published in Applied physics letters (29.05.2017)
Get more information
Journal Article
Quantification of local strain distributions in nanoscale strained SiGe FinFET structures
Mochizuki, Shogo, Murray, Conal E., Madan, Anita, Pinto, Teresa, Wang, Yun-Yu, Li, Juntao, Weng, Weihao, Jagannathan, Hemanth, Imai, Yasuhiko, Kimura, Shigeru, Takeuchi, Shotaro, Sakai, Akira
Published in Journal of applied physics (07.10.2017)
Published in Journal of applied physics (07.10.2017)
Get full text
Journal Article
Local strain in SiGe/Si heterostructures analyzed by X-ray microdiffraction
Mochizuki, Shogo, Sakai, Akira, Taoka, Noriyuki, Nakatsuka, Osamu, Takeda, Shingo, Kimura, Shigeru, Ogawa, Masaki, Zaima, Shigeaki
Published in Thin solid films (05.06.2006)
Published in Thin solid films (05.06.2006)
Get full text
Journal Article
Conference Proceeding
Strain relaxation of patterned Ge and SiGe layers on Si(0 0 1) substrates
Mochizuki, Shogo, Sakai, Akira, Nakatsuka, Osamu, Kondo, Hiroki, Yukawa, Katsunori, Izunome, Koji, Senda, Takeshi, Toyoda, Eiji, Ogawa, Masaki, Zaima, Shigeaki
Published in Semiconductor science and technology (01.01.2007)
Published in Semiconductor science and technology (01.01.2007)
Get full text
Journal Article
Conference Proceeding
Control of misfit dislocations in strain-relaxed SiGe buffer layers on SOI substrates
Taoka, Noriyuki, Sakai, Akira, Mochizuki, Shogo, Nakatsuka, Osamu, Ogawa, Masaki, Zaima, Shigeaki
Published in Thin solid films (05.06.2006)
Published in Thin solid films (05.06.2006)
Get full text
Journal Article
Conference Proceeding
Analysis of Microstructures in SiGe Buffer Layers on Silicon-on-Insulator Substrates
Taoka, Noriyuki, Sakai, Akira, Mochizuki, Shogo, Nakatsuka, Osamu, Ogawa, Masaki, Zaima, Shigeaki, Tezuka, Tsutomu, Sugiyama, Naoharu, Takagi, Shin-ichi
Published in Japanese Journal of Applied Physics (01.10.2005)
Published in Japanese Journal of Applied Physics (01.10.2005)
Get full text
Journal Article
NBTI Impact of Surface Orientation in Stacked Gate-All-Around Nanosheet Transistor
Zhou, Huimei, Wang, Miaomiao, Zhang, Jingyun, Watanabe, Koji, Durfee, Curtis, Mochizuki, Shogo, Bao, Ruqiang, Southwick, Richard, Bhuiyan, Maruf, Veeraraghavan, Basker
Published in 2020 IEEE International Reliability Physics Symposium (IRPS) (01.04.2020)
Published in 2020 IEEE International Reliability Physics Symposium (IRPS) (01.04.2020)
Get full text
Conference Proceeding
Channel Strain Dependence of Tinv in Strained Si and Sil-xGexFETs: Internal Strain-induced Modification of Chemical Oxidation
Lee, ChoongHyun, Mochizuki, Shogo, Miao, Xin, Li, Juntao, Southwick, Richard G.
Published in 2019 Symposium on VLSI Technology (01.06.2019)
Published in 2019 Symposium on VLSI Technology (01.06.2019)
Get full text
Conference Proceeding
Sub- 10^~\Omega -cm2 n-Type Contact Resistivity for FinFET Technology
Niimi, Hiroaki, Zuoguang Liu, Gluschenkov, Oleg, Mochizuki, Shogo, Fronheiser, Jody, Juntao Li, Demarest, James, Chen Zhang, Bei Liu, Jie Yang, Raymond, Mark, Haran, Bala, Huiming Bu, Yamashita, Tenko
Published in IEEE electron device letters (01.11.2016)
Published in IEEE electron device letters (01.11.2016)
Get full text
Journal Article
Backside Power Distribution for Nanosheet Technologies Beyond 2nm
Xie, Ruilong, Hong, Wonhyuk, Zhang, Chen, Lee, Jongjin, Brew, Kevin, Johnson, Richard, Lanzillo, Nicholas, Shobha, Hosadurga, Kim, Taesun, Park, Panjae, Mochizuki, Shogo, Saraf, Iqbal, Park, Chanro, Zhuang, Lei, Osborn, Clifford, Li, Wai Kin, Liu, Feng, Sankarapandian, Muthumanickam, Yang, Chung Ju, Li, Juntao, Tierney, Lukas, Pujari, Ruturaj, Sulehria, Yasir, Song, Yuncheng, Zhou, Huimei, Wang, Miaomiao, Belyansky, Michael, Ghosh, Somnath, Zhang, Haojun, Motoyama, Koichi, Sarkar, Debarghya, Kim, Wukang, Chu, Albert, Li, Tao, Carta, Fabio, Gluschenkov, Oleg, Oh, Joongsuk, Malley, Matthew, Chu, Pinlei, Nguyen, Son, Luedders, Katherine, Lee, Joe, Khan, Shahrukh, Chowdhury, Prabudhya Roy, Huang, Huai, Shadman, Abir, Sieg, Stuart, Dechene, Daniel, Edelstein, Daniel, Arnold, John, Yamashita, Tenko, Choi, Kisik, Seo, Kang-ill, Guo, Dechao, Bu, Huiming
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
Published in 2024 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits) (16.06.2024)
Get full text
Conference Proceeding