Low-Temperature Fabrication of Nickel Silicide Metal Oxide Semiconductor Capacitors at 280 °C by Metal Chloride Reduction Chemical Vapor Deposition
Oyama, Naoki, Ogura, Yuzuru, Mitake, Yoshihiko, Tomita, Yugo, Sakamoto, Hitoshi, Nagase, Shinichi, Watanabe, Masaru, Fujiwara, Naoto, Ohshima, Shigetoshi, Hirose, Fumihiko
Published in Japanese Journal of Applied Physics (15.06.2007)
Published in Japanese Journal of Applied Physics (15.06.2007)
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Journal Article
CATALYST STRUCTURAL BODY
FUJII HIDEJI, MITAKE YOSHIHIKO, TSURU YASUHIKO, AKIYAMA KATSUNORI, OTA SATOSHI
Year of Publication 28.09.2006
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Year of Publication 28.09.2006
Patent