Mitigation of surface contamination from resist outgassing in EUV lithography
Mertens, B.M., van der Zwan, B., de Jager, P.W.H., Leenders, M., Werij, H.G.C., Benschop, J.P.H., van Dijsseldonk, A.J.J.
Published in Microelectronic engineering (01.06.2000)
Published in Microelectronic engineering (01.06.2000)
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Conference Proceeding
Interfaces and strain in multilayers probed by NMR
de Gronckel, H.A.M., Mertens, B.M., Bloemen, P.J.H., Kopinga, K., de Jonge, W.J.M.
Published in Journal of magnetism and magnetic materials (01.02.1992)
Published in Journal of magnetism and magnetic materials (01.02.1992)
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Journal Article