Low sheet resistance buried metal bit line realized by high-temperature metal CVD process in vertical channel transistor array
Tian, Chao, Sun, Jiabao, Ping, Yanlei, Wang, Naizheng, Han, Baodong, Liu, Zhao, Li, Yongjie, Meng, Jingheng, Sun, Hongbo, Wang, Guilei, Chu, Jian, Shao, Guangsu, Shen, Jie, Qiu, Yunsong, Park, Ted, Xiao, Deyuan, Yoo, Abraham, Zhao, Chao
Published in Japanese Journal of Applied Physics (01.04.2024)
Published in Japanese Journal of Applied Physics (01.04.2024)
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Journal Article
High Aspect Ratio Contact Profile Control and Cryogenic Etch Process
Luo, Jie, Meng, Jingheng, Han, Baodong, Sun, Hongbo, Xiao, Deyuan, Zhao, Chao
Published in 2021 International Workshop on Advanced Patterning Solutions (IWAPS) (12.12.2021)
Published in 2021 International Workshop on Advanced Patterning Solutions (IWAPS) (12.12.2021)
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Conference Proceeding
Vertical Channel Transistor (VCT) as Access Transistor for Future 4F2 DRAM Architecture
Feng, Daohuan, Jiang, Yi, Qiu, Yunsong, Zheng, Yuhong, Kim, Harry, Kim, Jaewoo, Chu, Jian, Shao, Guangsu, Liao, Yucheng, Yang, Chen, Hu, Minrui, Zhao, Wenli, Xia, Linjiang, Xiao, Jianfeng, Ma, Di, Cheng, Yuan, Kong, Xiangbo, Lin, Chao, Li, Tianming, Li, Yongjie, Meng, Jingheng, Shao, Kai, Wang, Yan, Yang, Xiaoan, Liu, Xiang, Han, Qinghua, Li, Huiming, Tang, Yanzhe, Liu, Mingde, Wu, Eric, Li, Xiaoping, Huang, Renrui, Zhang, Mingtang, Hou, Long, Pan, Xuan, Jin, Xinwen, Zhao, Shuiping, Han, Dh, Park, Ted, Xiao, Deyuan, Zhao, Chao, Yoo, Abraham
Published in 2023 IEEE International Memory Workshop (IMW) (01.05.2023)
Published in 2023 IEEE International Memory Workshop (IMW) (01.05.2023)
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Conference Proceeding