Novel High-Performance Analog Devices for Advanced Low-Power High-$k$ Metal Gate Complementary Metal--Oxide--Semiconductor Technology
Han, Jin-Ping, Shimizu, Takashi, Pan, Li-Hong, Voelker, Moritz, Bernicot, Christophe, Arnaud, Franck, Mocuta, Anda, Stahrenberg, Knut, Azuma, Atsushi, Eller, Manfred, Yang, Guoyong, Jaeger, Daniel, Zhuang, Haoren, Miyashita, Katsura, Stein, Kenneth, Nair, Deleep, Park, Jae Hoo, Kohler, Sabrina, Hamaguchi, Masafumi, Li, Weipeng, Kim, Kisang, Chanemougame, Daniel, Kim, Nam Sung, Uchimura, Sadaharu, Tsutsui, Gen, Wiedholz, Christian, Miyake, Shinich, Meer, Hans van, Liang, Jewel, Ostermayr, Martin, Lian, Jenny, Celik, Muhsin, Donaton, Ricardo, Barla, Kathy, Na, MyungHee, Goto, Yoshiro, Sherony, Melanie, Johnson, Frank S, Wachnik, Richard, Sudijono, John, Kaste, Ed, Sampson, Ron, Ku, Ja-Hum, Steegen, An, Neumueller, Walter
Published in Japanese Journal of Applied Physics (01.04.2011)
Published in Japanese Journal of Applied Physics (01.04.2011)
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Influence of device engineering on the analog and RF performances of SOI MOSFETs
Kilchytska, V., Neve, A., Vancaillie, L., Levacq, D., Adriaensen, S., van Meer, H., De Meyer, K., Raynaud, C., Dehan, M., Raskin, J.-P., Flandre, D.
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Published in IEEE transactions on electron devices (01.03.2003)
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Published in 2021 20th International Workshop on Junction Technology (IWJT) (10.06.2021)
Published in 2021 20th International Workshop on Junction Technology (IWJT) (10.06.2021)
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Conference Proceeding
Novel High-Performance Analog Devices for Advanced Low-Power High- k Metal Gate Complementary Metal–Oxide–Semiconductor Technology
Han, Jin-Ping, Shimizu, Takashi, Pan, Li-Hong, Voelker, Moritz, Bernicot, Christophe, Arnaud, Franck, Mocuta, Anda, Stahrenberg, Knut, Azuma, Atsushi, Eller, Manfred, Yang, Guoyong, Jaeger, Daniel, Zhuang, Haoren, Miyashita, Katsura, Stein, Kenneth, Nair, Deleep, Park, Jae Hoo, Kohler, Sabrina, Hamaguchi, Masafumi, Li, Weipeng, Kim, Kisang, Chanemougame, Daniel, Kim, Nam Sung, Uchimura, Sadaharu, Tsutsui, Gen, Wiedholz, Christian, Miyake, Shinich, Meer, Hans van, Liang, Jewel, Ostermayr, Martin, Lian, Jenny, Celik, Muhsin, Donaton, Ricardo, Barla, Kathy, Goto, Yoshiro, Sherony, Melanie, Johnson, Frank S., Wachnik, Richard, Sudijono, John, Kaste, Ed, Sampson, Ron, Ku, Ja-Hum, Steegen, An, Neumueller, Walter
Published in Japanese Journal of Applied Physics (01.04.2011)
Published in Japanese Journal of Applied Physics (01.04.2011)
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The Defect Formation Mechanism Associated with Low Dose Implants into Si Fin Structures
Jones, Kevin, Turner, Emily, Lee, Jae Young, van Meer, Hans, Variam, Naushad, Avci, Ibrahim
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01.09.2018)
Published in 2018 22nd International Conference on Ion Implantation Technology (IIT) (01.09.2018)
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Ion implant applications to enable advances in semiconductor technologies
Rao, K. V., van Meer, Hans, Kyu-Ha Shim, Ito, Hiro, Henry, Todd
Published in 2017 17th International Workshop on Junction Technology (IWJT) (01.06.2017)
Published in 2017 17th International Workshop on Junction Technology (IWJT) (01.06.2017)
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Conference Proceeding