Multiscale Modeling of the Atomic Layer Deposition of HfO2 Thin Film Grown on Silicon: How to Deal with a Kinetic Monte Carlo Procedure
Dkhissi, A, Estève, A, Mastail, C, Olivier, S, Mazaleyrat, G, Jeloaica, L, Djafari Rouhani, M
Published in Journal of chemical theory and computation (11.11.2008)
Published in Journal of chemical theory and computation (11.11.2008)
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Journal Article
Nucleation and growth of atomic layer deposition of HfO2 gate dielectric layers on silicon oxide: a multiscale modelling investigation
DKHISSI, A, MAZALEYRAT, G, ESTEVE, A, DJAFARI ROUHANI, M
Published in PCCP. Physical chemistry chemical physics (Print) (01.01.2009)
Published in PCCP. Physical chemistry chemical physics (Print) (01.01.2009)
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Conference Proceeding
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A methodology for the kinetic Monte Carlo simulation of alumina atomic layer deposition onto silicon
Mazaleyrat, G., Estève, A., Jeloaica, L., Djafari-Rouhani, M.
Published in Computational materials science (01.04.2005)
Published in Computational materials science (01.04.2005)
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Journal Article
Conference Proceeding
Multiscale Modeling of the Atomic Layer Deposition of HfO 2 Thin Film Grown on Silicon: How to Deal with a Kinetic Monte Carlo Procedure
Dkhissi, A., Estève, A., Mastail, C., Olivier, S., Mazaleyrat, G., Jeloaica, L., Djafari Rouhani, M.
Published in Journal of chemical theory and computation (11.11.2008)
Published in Journal of chemical theory and computation (11.11.2008)
Get full text
Journal Article