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LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF
Year of Publication
25.06.2014
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Non-Perturbative effects from orbifold constructions
by
Aldazabal, G
Year of Publication
07.04.1998
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Non-Perturbative Heterotic D=6,4 Orbifold Vacua
by
Aldazabal, G
,
Font, A
,
Ibanez, L. E
,
Uranga, A. M
,
Violero, G
Year of Publication
23.06.1997
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Non-Perturbative effects from orbifold constructions
by
Aldazabal, G
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arXiv.org
(07.04.1998)
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Physics of radioactive nuclear beams: Theoretical perspective
by
Nazarewicz, Witold
Published in
Acta physica Hungarica. New series, Heavy ion physics
(01.10.1997)
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Non-Perturbative Heterotic D=6,4 Orbifold Vacua
by
Aldazabal, G
,
Font, A
,
Ibanez, L E
,
Uranga, A M
,
Violero, G
Published in
arXiv.org
(30.06.1997)
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ABOUT NEUTRAL KAONS AND SIMILAR SYSTEMS: FROM QUANTUM FIELD THEORY TO EFFECTIVE MASS MATRICES
by
MACHET, B.
Published in
International journal of modern physics. A, Particles and fields, gravitation, cosmology
(10.01.2005)
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LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF
by
STORET, YVAN
,
DOLMAZON, NELLY
,
TORT, FREDERIC
,
SANTIAGO, JOSE
Year of Publication
03.01.2017
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LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF
by
JOSÉ SANTIAGO
,
NELLY DOLMAZON
,
YVAN STORET
,
FRÉDÉRIC TORT
Year of Publication
09.03.2016
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LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF
by
NELLY DOLMAZON
,
YVAN STORET
,
FREDERIC TORT
,
JOSE SANTIAGO
Year of Publication
08.02.2012
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LOW MOLECULAR WEIGHT (METH) ACRYLIC POLYMERS FREE OF SULPHUR-CONTAINING, METALLIC AND HALOGENATED COMPOUNDS AND WITH A LOW DEGREE OF RESIDUAL MONOMERS, PROCESS FOR THE PREPARATION THEREOF AND USES THEREOF
by
STORET, YVAN
,
DOLMAZON, NELLY
,
TORT, FREDERIC
,
SANTIAGO, JOSE
Year of Publication
30.09.2010
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