Evaluation of second generation DUV resists for advanced microprocessors
Maltabes, J.G., Yuan, C., Fu, C.C., Sturtevant, J.S., Blackley, S., Pressley, L.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Journal Article
Conference Proceeding
Model based lithographic tool choices for a continuous state-of-the-art factory
Maltabes, J.G., Perkinson, T.L., Litt, L.C., Hershey, R., Murphy, S.
Published in Microelectronic engineering (01.03.1998)
Published in Microelectronic engineering (01.03.1998)
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Journal Article
Conference Proceeding
Imaging techniques to support low k1 optical lithography
Conley, W., Nelson-Thomas, C., Brankner, K., Wei Wu, Strozewski, K., Thompson, M., Lucas, K., Garza, C., Chi-Min Yuan, Carter, R., Montgomery, P., Socha, R., Yu, L., van den Broke, D., Wampler, K., Schaefer, E., Cassel, S., Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Maltabes, J.G., Dieu, L., Fanucchi, E.L., Hughes, G., Mellenthin, D., Kasprowicz, B., Progler, C.
Published in 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers (2002)
Published in 2002 International Microprocesses and Nanotechnology Conference, 2002. Digest of Papers (2002)
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Conference Proceeding