Dissolution inhibitors for 193-nm chemically amplified resists
USHIROGOUCHI, T, ASAKAWA, K, OKINO, T, SHIDA, N, KIHARA, N, NAKASE, M
Published in Japanese Journal of Applied Physics (01.12.1997)
Published in Japanese Journal of Applied Physics (01.12.1997)
Get full text
Conference Proceeding
Journal Article
Simulation study on phase-shifting masks for isolated patterns
INOUE, S, TANAKA, Y, SATO, T, TAMAMUSHI, S, NAKASE, M
Published in Japanese Journal of Applied Physics (01.11.1991)
Published in Japanese Journal of Applied Physics (01.11.1991)
Get full text
Journal Article
KrF excimer laser process : lateral and surface modification for enhancing resist contrast
MINAMIYAMA, T, KUMAGAE, A, SATO, K, ITO, S, NAKASE, M
Published in Japanese Journal of Applied Physics (01.06.1992)
Published in Japanese Journal of Applied Physics (01.06.1992)
Get full text
Journal Article
Optimization of a high-performance chemically amplified positive resist for electron-beam lithography
NAKASUGI, T, TAMURA, H, NIIYAMA, H, SAITO, S, KIHARA, N, NAITO, T, NAKASE, M
Published in Japanese Journal of Applied Physics (01.12.1996)
Published in Japanese Journal of Applied Physics (01.12.1996)
Get full text
Conference Proceeding
Journal Article
EB Resist Materials Consist of Catechol Derivatives
Kihara, Naoko, Saito, Satoshi, Ushirogouchi, Tohru, Nakase, Makoto
Published in Journal of Photopolymer Science and Technology (1998)
Published in Journal of Photopolymer Science and Technology (1998)
Get full text
Journal Article
Chemically amplified resist using self-solubility acceleration effect
KIHARA, N, USHIROGOUCHI, T, TADA, T, NAITO, T, SAITO, S, NAKASE, M
Published in Journal of the Electrochemical Society (01.11.1994)
Published in Journal of the Electrochemical Society (01.11.1994)
Get full text
Journal Article
HIGH PERFORMANCE CHEMICALLY AMPLIFIED POSITIVE ELECTRON-BEAM RESIST: OPTIMIZATION OF BASE ADDITIVES FOR ENVIRONMENTAL STABILIZATION
SAITO, SATOSHI, KIHARA, NAOKO, NAITO, TAKUYA, NAKASE, MAKOTO, NAKASUGI, TETSURO, KATO, YOSHIMITSU
Published in Journal of Photopolymer Science and Technology (1996)
Published in Journal of Photopolymer Science and Technology (1996)
Get full text
Journal Article
Molecular Design of Acid Generators for EB and ArF Excimer Laser Exposure Using Molecular Orbital Calculations
Ushirogouchi, Tohru, Kihara, Naoko, Saito, Satoshi, Naito, Takuya, Asakawa, Koji, Tada, Tsukasa, Nakase, Makoto
Published in Journal of Photopolymer Science and Technology (1994)
Published in Journal of Photopolymer Science and Technology (1994)
Get full text
Journal Article