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Published in Microelectronic engineering (15.04.2018)
Published in Microelectronic engineering (15.04.2018)
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Reducing proximity effects in optical lithography
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Conference Proceeding
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Stochastic limitations to EUV lithography
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Published in 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) (01.04.2018)
Published in 2018 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) (01.04.2018)
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Conference Proceeding
Electron beam lithography simulation for mask making
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Conference Proceeding