Gaussian process regression for virtual metrology of plasma etch
Lynn, S, Ringwood, J, MacGearailt, N
Published in IET Irish Signals and Systems Conference (ISSC 2010) (2010)
Published in IET Irish Signals and Systems Conference (ISSC 2010) (2010)
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Conference Proceeding
Global and Local Virtual Metrology Models for a Plasma Etch Process
Lynn, S. A., Ringwood, J., MacGearailt, N.
Published in IEEE transactions on semiconductor manufacturing (01.02.2012)
Published in IEEE transactions on semiconductor manufacturing (01.02.2012)
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Journal Article
An analysis of noise on optical emission spectroscopy measurements
Beibei Ma, McLoone, S, Ringwood, J, MacGearailt, N
Published in IET Irish Signals and Systems Conference (ISSC 2010) (2010)
Published in IET Irish Signals and Systems Conference (ISSC 2010) (2010)
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Conference Proceeding
Identifying key process characteristics and predicting etch rate from high-dimension datasets
Ragnoli, E., McLoone, S., Lynn, S., Ringwood, J., Macgearailt, N.
Published in 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2009)
Published in 2009 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (01.05.2009)
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Conference Proceeding
Combination of modeling and simple real-time measurements to control plasma-surface interaction processes
Greb, A., Niemi, K., O'Connell, D., Gans, T., Ennis, G. J., MacGearailt, N.
Published in 2012 Abstracts IEEE International Conference on Plasma Science (01.07.2012)
Published in 2012 Abstracts IEEE International Conference on Plasma Science (01.07.2012)
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Conference Proceeding
Real-time virtual metrology and control of etch rate in an industrial plasma chamber
Lynn, S. A., MacGearailt, N., Ringwood, J. V.
Published in 2012 IEEE International Conference on Control Applications (01.10.2012)
Published in 2012 IEEE International Conference on Control Applications (01.10.2012)
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Conference Proceeding