High rate preparation of a-Si:H by reactive evaporation method
SHINDO, M, SATO, S, MYOKAN, I, MANO, S, SHIBATA, T
Published in Japanese Journal of Applied Physics (01.01.1984)
Published in Japanese Journal of Applied Physics (01.01.1984)
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Conference Proceeding
Journal Article
Preparation capacity of reactive evaporation method for amorphous silicon
SHINDO, M, SATO, S, MYOKAN, I, MANO, S, SHIBATA, T
Published in Japanese Journal of Applied Physics (1985)
Published in Japanese Journal of Applied Physics (1985)
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Journal Article
Bombardment damage in reactively-evaporated a-Si: H
SHINDO, M, SATO, S, MYOKAN, I, MANO, S, SHIBATA, T
Published in Japanese Journal of Applied Physics (01.01.1985)
Published in Japanese Journal of Applied Physics (01.01.1985)
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Journal Article
IMAGE FORMATION METHOD
MATSUZAKI, MASATOSHI, SHIMA, TETSUO, YAMAZAKI, TOSHINORI, MYOKAN, ISAO, TARUMI, NORIYOSHI
Year of Publication 31.03.1983
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Year of Publication 31.03.1983
Patent
SEMI-CONDUCTOR MATERIAL AND PROCESS FOR ITS PRODUCTION
SHIMA, TETSUO, OTA, TATSUO, SATO, SHIGERU, SHINDO, MASANARI, MYOKAN, ISAO
Year of Publication 31.03.1983
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Year of Publication 31.03.1983
Patent
METHOD AND DEVICE FOR PRODUCING AMORPHOUS SILICON SOLAR BATTERY
SHIMA, TETSUO, OTA, TATSUO, SATO, SHIGERU, SHINDO, MASANARI, MYOKAN, ISAO
Year of Publication 17.03.1983
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Year of Publication 17.03.1983
Patent