Cooperative simulation of lithography and topography for three-dimensional high-aspect-ratio etching
Ichikawa, Takashi, Yagisawa, Takashi, Furukawa, Shinichi, Taguchi, Takafumi, Nojima, Shigeki, Murakami, Sadatoshi, Tamaoki, Naoki
Published in Japanese Journal of Applied Physics (01.06.2018)
Published in Japanese Journal of Applied Physics (01.06.2018)
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