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"MORROW XIAORONG"
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"MORROW XIAORONG"
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Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects
by
Morrow
,
Xiaorong
,
Leu, Jihperng
,
Kuhn, Markus
,
Maiz, Jose A
Year of Publication
30.10.2012
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Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects
by
MORROW XIAORONG
,
MAIZ JOSE A
,
LEU JIHPERNG
,
KUHN MARKUS
Year of Publication
30.10.2012
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Semiconductor device having a dual damascene interconnect spaced from a support structure
by
MORROW XIAORONG
,
MORROW PATRICK
Year of Publication
09.12.2003
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Semiconductor device having a dual damascene interconnect spaced from a support structure
by
Morrow, Patrick
,
Morrow
,
Xiaorong
Year of Publication
09.12.2003
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METHOD OF MAKING A SEMICONDUCTOR DEVICE HAVING A DUAL DAMASCENE INTERCONNECT SPACED FROM A SUPPORT STRUCTURE
by
Morrow
,
Xiaorong
,
Morrow, Patrick
Year of Publication
03.10.2002
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METHOD OF MAKING A SEMICONDUCTOR DEVICE HAVING A DUAL DAMASCENE INTERCONNECT SPACED FROM A SUPPORT STRUCTURE
by
MORROW XIAORONG
,
MORROW PATRICK
Year of Publication
03.10.2002
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Method of making a semiconductor device having a dual damascene interconnect spaced from a support structure
by
Morrow, Patrick
,
Morrow
,
Xiaorong
Year of Publication
10.09.2002
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Method of making a semiconductor device having a dual damascene interconnect spaced from a support structure
by
MORROW XIAORONG
,
MORROW PATRICK
Year of Publication
10.09.2002
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Sealing porous dielectrics with silane coupling reagents
by
Kloster, Grant
,
Wu, Chih-I
,
Morrow
,
Xiaorong
Year of Publication
25.11.2008
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METHOD AND APPARATUS FOR FORMING METAL-METAL OXIDE ETCH STOP/BARRIER FOR INTEGRATED CIRCUIT INTERCONNECTS
by
MORROW XIAORONG
,
MAIZ JOSE A
,
LEU JIHPERNG
,
KUHN MARKUS
Year of Publication
02.09.2010
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Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects
by
MORROW XIAORONG
,
MAIZ JOSE A
,
LEU JIHPERNG
,
KUHN MARKUS
Year of Publication
01.06.2010
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Method and apparatus for forming metal-metal oxide etch stop/barrier for integrated circuit interconnects
by
Morrow
,
Xiaorong
,
Leu, Jihperng
,
Kuhn, Markus
,
Maiz, Jose A
Year of Publication
01.06.2010
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HERSTELLEN EINES METALL-METALLOXID ÄTZSTOPPERS/ ELEKTROMIGRATIONSBARRIERE FÜR KONTAKTMETALLISIERUNGEN IN INTEGRIERTEN SCHALTKREISEN UND ZUGEHÖRIGES BAUELEMENT
by
MIAZ, JOSE
,
LEU, JIHPERNG
,
MORROW
,
XIAORONG
,
KUHN, MARKUS
Year of Publication
15.11.2009
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METHOD FOR FORMING METAL-METAL OXIDE ETCH STOP/ ELECTROMIGRATION BARRIER FOR INTEGRATED CIRCUIT INTERCONNECTS AND DEVICE
by
MIAZ, JOSE
,
LEU, JIHPERNG
,
MORROW
,
XIAORONG
,
KUHN, MARKUS
Year of Publication
28.10.2009
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Sealing porous dielectrics with silane coupling reagents
by
Kloster, Grant
,
Wu, Chih-I
,
Morrow
,
Xiaorong
Year of Publication
17.10.2006
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Sealing porous dielectrics with silane coupling reagents
by
MORROW XIAORONG
,
WU CHIH-I
,
KLOSTER GRANT
Year of Publication
25.11.2008
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Metal-metal oxide etch stop/barrier for integrated circuit interconnects
by
MORROW XIAORONG
,
MAIZ JOSE A
,
LEU JIHPERNG
,
KUHN MARKUS
Year of Publication
04.03.2008
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Metal-metal oxide etch stop/barrier for integrated circuit interconnects
by
Morrow
,
Xiaorong
,
Leu, Jihperng
,
Kuhn, Markus
,
Maiz, Jose A
Year of Publication
04.03.2008
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Low-K dielectric structure and method
by
Morrow
,
Xiaorong
,
Kloster, Grant
,
Leu, Jihperng
Year of Publication
27.05.2004
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Low-K dielectric structure and method
by
MORROW XIAORONG
,
KLOSTER GRANT M
,
LEU JIHPERNG
Year of Publication
27.05.2004
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