High Quality SiO2/Al2O3 Gate Stack for GaN Metal--Oxide--Semiconductor Field-Effect Transistor
Kambayashi, Hiroshi, Nomura, Takehiko, Ueda, Hirokazu, Harada, Katsushige, Morozumi, Yuichiro, Hasebe, Kazuhide, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Jpn J Appl Phys (25.04.2013)
Published in Jpn J Appl Phys (25.04.2013)
Get full text
Journal Article
METHOD OF FORMING FILM AND APPARATUS OF FORMING FILM
MIYATANI KOTARO, NAKAMURA HIDEO, KARAKAWA TAKAYUKI, HARADA TAKESHIGE, MOROZUMI YUICHIRO
Year of Publication 16.05.2023
Get full text
Year of Publication 16.05.2023
Patent
FILM FORMING METHOD AND FILM FORMING APPARATUS
MIYATANI KOTARO, NAKAMURA HIDEO, KARAKAWA TAKAYUKI, MOROZUMI YUICHIRO, HARADA KATSUSHIGE
Year of Publication 09.05.2023
Get full text
Year of Publication 09.05.2023
Patent
High-performance stacked TiO2-ZrO2 and Si-doped ZrO2 metal-insulator-metal capacitors
Padmanabhan, Revathy, Bhat, Navakanta, Mohan, S., Morozumi, Yuichiro, Kaushal, Sanjeev
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
Published in 2014 IEEE International Conference on IC Design & Technology (01.05.2014)
Get full text
Conference Proceeding
High Quality SiO sub(2)/Al sub(2)O sub(3 ) Gate Stack for GaN Metal-Oxide-Semiconductor Field-Effect Transistor
Kambayashi, Hiroshi, Nomura, Takehiko, Ueda, Hirokazu, Harada, Katsushige, Morozumi, Yuichiro, Hasebe, Kazuhide, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2013)
Published in Japanese Journal of Applied Physics (01.04.2013)
Get full text
Journal Article
High Quality SiO 2 /Al 2 O 3 Gate Stack for GaN Metal–Oxide–Semiconductor Field-Effect Transistor
Kambayashi, Hiroshi, Nomura, Takehiko, Ueda, Hirokazu, Harada, Katsushige, Morozumi, Yuichiro, Hasebe, Kazuhide, Teramoto, Akinobu, Sugawa, Shigetoshi, Ohmi, Tadahiro
Published in Japanese Journal of Applied Physics (01.04.2013)
Published in Japanese Journal of Applied Physics (01.04.2013)
Get full text
Journal Article
DEPOSITION METHOD AND DEPOSITION DEVICE
KAZUMURA TAMOTSU, WATABE HEIJI, SHINONOME SHUJI, KASHIWAGI YUSAKU, TAKAHASHI HIROSUKE, HARADA TAKESHIGE, HOSOI TAKUJI, SHIMURA TAKAYOSHI, MOROZUMI YUICHIRO
Year of Publication 16.02.2017
Get full text
Year of Publication 16.02.2017
Patent
DEPOSITION APPARATUS AND DEPOSITION METHOD
WATABE HEIJI, SHINONOME SHUJI, KASHIWAGI YUSAKU, NAKAJIMA SHIGERU, HARADA TAKESHIGE, HOSOI TAKUJI, SHIMURA TAKAYOSHI, MOROZUMI YUICHIRO
Year of Publication 09.11.2015
Get full text
Year of Publication 09.11.2015
Patent
METHOD OF FORMING SILICON OXIDE FILM
HASEBE KAZUHIDE, MURAKAMI HIROKI, SATO JUN, MOROZUMI YUICHIRO, IKEUCHI TOSHIYUKI
Year of Publication 08.05.2013
Get full text
Year of Publication 08.05.2013
Patent