Overlay error estimation of wafer rear surface alignment for 0.1-μm lithography
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Conference Proceeding
Mechanically Ruled Stigmatic Concave Gratings
Harada, Tatsuo, Moriyama, Shigeo, Kita, Toshiaki
Published in Japanese Journal of Applied Physics (01.01.1975)
Published in Japanese Journal of Applied Physics (01.01.1975)
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Journal Article
Study on STI planarization process using fixed abrasive tool (1st Report): Factor analysis to obtain flatter surface
KATAGIRI, Souichi, YASUI, Kan, YAMAGUCHI, Ui, KAWAMURA, Yoshio, KAWAI, Ryousei, KANAI, Fumiyuki, TOKUDA, Mitsuo, HONDA, Minoru, MORIYAMA, Shigeo
Published in Journal of the Japan Society for Precision Engineering, Contributed Papers (05.01.2004)
Published in Journal of the Japan Society for Precision Engineering, Contributed Papers (05.01.2004)
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Journal Article
SEMICONDUCTOR PRODUCTION SYSTEM
TOMIYOSHI RIKIO, MORIYAMA SHIGEO, SHIMAMURA KOTARO, KIKUCHI MUTSUMI, NAYA HIDEMITSU
Year of Publication 29.08.2002
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Year of Publication 29.08.2002
Patent
Vanadium Carbide Layers Formed on Cast Irons Immersed in Molten Borax Baths
ARAI, Tohru, MORIYAMA, Shigeo, SUGIMOTO, Yoshihiko
Published in THE JOURNAL OF THE JAPAN FOUNDRYMEN'S SOCIETY (25.02.1988)
Published in THE JOURNAL OF THE JAPAN FOUNDRYMEN'S SOCIETY (25.02.1988)
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Journal Article
POLISHING APPARATUS AND A SEMICONDUCTOR MANUFACTURING METHOD USING THE SAME
ISHIDA, YOSHIHIRO, MORIYAMA, SHIGEO, KUGAYA, TAKASHI, YASUI, KAN, KATAGIRI, SOICHI, KAWAI, RYOSEI, OOTSUKI, SHIGEO, NISHIMURA, SADAYUKI
Year of Publication 04.05.2000
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Year of Publication 04.05.2000
Patent
METHOD AND DEVICE FOR MANUFACTURING SEMICONDUCTOR
YOKOYAMA, NATSUKI, HIDAKA, MINORU, MORIYAMA, SHIGEO, UCHIDA, FUMIHIKO, KAWAMOTO, YOSHIFUMI, KAWAMURA, YOSHIO, MATSUI, MIYAKO, YAMAMOTO, TATSUHARU
Year of Publication 22.08.1996
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Year of Publication 22.08.1996
Patent