Fabrication of metal gate electrode by reactive sputtering deposition
YAMADA, Takayuki, MORIWAKI, Masaru, HARADA, Yoshinao, ERIGUCHI, Koji
Published in Oyo Buturi (10.09.2000)
Published in Oyo Buturi (10.09.2000)
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Journal Article
Improved Metal Gate Process by Simultaneous Gate-Oxide Nitridation during W/WN x Gate Formation
Moriwaki, Masaru, Yamada, Takayuki, Harada, Yoshinao, Fujii, Shinji, Yamanaka, Michinari, Shibata, Jun, Mori, Yoshihiro
Published in Japanese Journal of Applied Physics (01.04.2000)
Published in Japanese Journal of Applied Physics (01.04.2000)
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Journal Article