Highly Selective Etching of Poly-Si by Time Modulation Bias
Ono, Tetsuo, Miyazaki, Hiroshi, Mizutani, Tatsumi, Goto, Yasushi, Kure, Tokuo
Published in Japanese Journal of Applied Physics (01.09.1999)
Published in Japanese Journal of Applied Physics (01.09.1999)
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Highly Anisotropic Etching of Polysilicon by Time-Modulation Bias
Ono, Tetsuo, Mizutani, Tatsumi, Goto, Yasushi, Kure, Tokuo
Published in Japanese Journal of Applied Physics (01.08.2000)
Published in Japanese Journal of Applied Physics (01.08.2000)
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Journal Article
Mechanism of CF Polymer Film Deposition through High-Aspect-Ratio SiO 2 Holes
Ono, Tetsuo, Hamasaki, Ryoji, Tatsumi Mizutani, Tatsumi Mizutani
Published in Japanese Journal of Applied Physics (01.12.1994)
Published in Japanese Journal of Applied Physics (01.12.1994)
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Journal Article
Mechanism of radiation damage in SiO2/Si induced by vuv photons
YUNOGAMI, T, MIZUTANI, T, TSUJIMOTO, K, SUZUKI, K
Published in Japanese journal of applied physics (01.10.1990)
Published in Japanese journal of applied physics (01.10.1990)
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Journal Article
Mechanism of E' center generation in SiO2 film by ion and neutral beam bombardment
YOKOGAWA, K, YAJIMA, Y, MIZUTANI, T, NISHIMATSU, S, NINOMIYA, K
Published in Japanese journal of applied physics (01.11.1991)
Published in Japanese journal of applied physics (01.11.1991)
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Positive charges and E' centers formed by vacuum ultraviolet radiation in SiO2 grown on Si
YOKOGAWA, K, YAJIMA, Y, MIZUTANI, T, NISHIMATSU, S, SUZUKI, K
Published in Japanese journal of applied physics (01.10.1990)
Published in Japanese journal of applied physics (01.10.1990)
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Journal Article