Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography
Masuda, Seiya, Tarutani, Shinji, Kamimura, Sou, Hirano, Shuuji, Hoshino, Wataru, Mizutani, Kazuyoshi
Published in Journal of Photopolymer Science and Technology (01.01.2007)
Published in Journal of Photopolymer Science and Technology (01.01.2007)
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Journal Article
Reduction of the Outgassing Segment in Acetal based Chemically Amplified Resist for EUV Lithography
Masuda, Seiya, Kawanishi, Yasutomo, Hirano, Shuuji, Kamimura, Sou, Mizutani, Kazuyoshi, Shitabatake, Koji
Published in Journal of Photopolymer Science and Technology (01.01.2006)
Published in Journal of Photopolymer Science and Technology (01.01.2006)
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Journal Article
Study and Control of the Interfacial Mass Transfer of Resist Components in 193nm Immersion Lithography
Kanna, Shinichi, Inabe, Haruki, Yamamoto, Kei, Tarutani, Shinji, Kanda, Hiromi, Mizutani, Kazuyoshi, Kitada, Kazuyuki, Uno, Shinji, Kawabe, Yasumasa
Published in Journal of Photopolymer Science and Technology (01.01.2005)
Published in Journal of Photopolymer Science and Technology (01.01.2005)
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Journal Article
A HFIPS-based Polymer Approach for 157 nm Single Layer Photoresist
Kanna, Shinichi, Mizutani, Kazuyoshi, Yasunami, Shoichiro, Kawabe, Yasumasa, Tan, Shiro, Yagihara, Morio, Kokubo, Tadayoshi, Malik, Sanjay, Dilocker, Stephanie
Published in Journal of Photopolymer Science and Technology (01.01.2003)
Published in Journal of Photopolymer Science and Technology (01.01.2003)
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Journal Article