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Published in Japanese Journal of Applied Physics (01.10.2006)
Published in Japanese Journal of Applied Physics (01.10.2006)
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Roles of rare earth oxide additives in millimeter-wave sintering of AlN
Makino, Yukio, Yoshioka, Takashi, Nakano, Hiromi, Ueno, Toshiyuki, Miyake, Shoji
Published in Journal of rare earths (01.04.2008)
Published in Journal of rare earths (01.04.2008)
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HfO2 thin films prepared by ion beam assisted deposition
Mori, Takanori, Fujiwara, Makoto, Manory, Rafael R., Shimizu, Ippei, Tanaka, Takeo, Miyake, Shoji
Published in Surface & coatings technology (02.06.2003)
Published in Surface & coatings technology (02.06.2003)
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Preparation of high quality strontium titanate based thin films by ECR plasma sputtering
Miyake, Shoji, Baba, So, Niino, Atsutoshi, Numata, Ken
Published in Surface & coatings technology (02.06.2003)
Published in Surface & coatings technology (02.06.2003)
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Production of Inductively-Coupled Large-Diameter Plasmas with Internal Antenna
Setsuhara, Yuichi, Miyake, Shoji, Sakawa, Yoichi, Shoji, Tatsuo
Published in Japanese Journal of Applied Physics (01.07.1999)
Published in Japanese Journal of Applied Physics (01.07.1999)
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COMMUNICATION DEVICE, COMMUNICATION SWITCH, AND ITAS PERIOD SETTING METHOD
HIKIJI KENICHI, NISHIMURA KAZUTO, TAKEZAWA JIRO, SABETTO YOSHIKAZU, MIYAKE SHOJI
Year of Publication 08.02.2024
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Year of Publication 08.02.2024
Patent
Preparation of strontium titanate thin films by mirror-confinement-type electron cyclotron resonance plasma sputtering
Baba, So, Numata, Ken, Saito, Hidenori, Kumagai, Masao, Ueno, Toshiyuki, Kyoh, Bunkei, Miyake, Shoji
Published in Thin solid films (30.06.2001)
Published in Thin solid films (30.06.2001)
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Conference Proceeding
Morphology and Microstructure of Hard and Superhard Zr–Cu–N Nanocomposite Coatings
Musil, Jindrich, Vlcek, Jaroslav, Zeman, Petr, Setsuhara, Yuichi, Miyake, Shoji, Konuma, Seiji, Kumagai, Masao, Mitterer, Christian
Published in Japanese Journal of Applied Physics (2002)
Published in Japanese Journal of Applied Physics (2002)
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Formation of carbon nitride films by helicon wave plasma enhanced DC sputtering
ZHANG, J. Q, SETSUHARA, Y, MIYAKE, S, KYOH, B
Published in Japanese Journal of Applied Physics (01.11.1997)
Published in Japanese Journal of Applied Physics (01.11.1997)
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Measurement of ion temperature in electron cyclotron resonance plasma
OKUNO, Y, OHTSU, Y, FUJITA, H, WEI CHEN, MIYAKE, S
Published in Japanese Journal of Applied Physics (01.11.1993)
Published in Japanese Journal of Applied Physics (01.11.1993)
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Inductively-coupled-plasma-assisted planar magnetron discharge for enhanced ionization of sputtered atoms
SETSUHARA, Y, KAMAI, M, MIYAKE, S, MUSIL, J
Published in Japanese Journal of Applied Physics (01.07.1997)
Published in Japanese Journal of Applied Physics (01.07.1997)
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Conference Proceeding
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