Search Results - "MIYAHARA JUNYA" :: K.UTB vyhledávací portál

Tungsten film forming method and storage medium

by Miyahara, Junya, Maekawa, Koji, Hotta, Takanobu, Nasu, Masayuki, Suzuki, Kenji, Maruyama, Tomohisa
Year of Publication 03.09.2019

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METHOD OF CONTROLLING THRESHOLD OF TRANSISTOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

by MIYAHARA Junya, AKIYAMA Koji, FUJINO Yutaka, SHIRAGA Kentaro
Year of Publication 03.08.2017

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METHOD FOR MANUFACTURING INSULATING FILM LAMINATED STRUCTURE

by MIYAHARA Junya, FUJINO Yutaka, NAKAMURA Genji, SHIRAGA Kentaro
Year of Publication 15.06.2017

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Hill plot focusing on Ce compounds with high magnetic-ordering-temperatures and consequent study of Ce2AuP3

by Miyahara, Junya, Shirakawa, Naoki, Setoguchi, Yuta, Tsubota, Masami, Kuroiwa, Kento, Kitagawa, Jiro
Published in arXiv.org (19.02.2018)

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TUNGSTEN FILM FORMING METHOD AND STORAGE MEDIUM

by MIYAHARA Junya, SUZUKI Kenji, HOTTA Takanobu, MAEKAWA Koji, NASU Masayuki, MARUYAMA Tomohisa
Year of Publication 05.10.2017

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PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

by FUJINO YUTAKA, MIYAHARA JUNYA, SHIOZAWA TOSHIHIKO
Year of Publication 19.08.2013

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TWI731052B

by MIYAHARA, JUNYA, NASU, MASAYUKI, MARUYAMA, TOMOHISA, MAEKAWA, KOJI, SUZUKI, KENJI, HOTTA, TAKANOBU
Year of Publication 21.06.2021

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SILICON DIOXIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE

by NAKANISHI TOSHIO, HONDA MINORU, MIYAHARA JUNYA, KOHNO MASAYUKI
Year of Publication 24.05.2012

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Forming a silicon nitride film by plasma CVD

by NISHITA TATSUO, NAKANISHI TOSHIO, HONDA MINORU, MIYAHARA JUNYA, KOHNO MASAYUKI
Year of Publication 21.02.2012

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Forming a silicon nitride film by plasma CVD

by Honda, Minoru, Nakanishi, Toshio, Kohno, Masayuki, Nishita, Tatsuo, Miyahara, Junya
Year of Publication 21.02.2012

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SILICON OXIDE FILM, METHOD FOR FORMING SILICON OXIDE FILM, AND PLASMA CVD APPARATUS

by NAKANISHI TOSHIO, HONDA MINORU, MIYAHARA JUNYA, KOHNO MASAYUKI
Year of Publication 25.08.2011

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SILICON OXYNITRIDE FILM AND PROCESS FOR PRODUCTION THEREOF, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE

by NISHITA TATSUO, HONDA MINORU, MIYAHARA JUNYA, KOHNO MASAYUKI
Year of Publication 04.08.2011

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PROCESS FOR PRODUCING SILICON NITRIDE FILM, PROCESS FOR PRODUCING SILICON NITRIDE FILM LAMINATE, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE

by NISHITA TATSUO, NAKANISHI TOSHIO, HONDA MINORU, MIYAHARA JUNYA, KOHNO MASAYUKI
Year of Publication 14.04.2011

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SILICON OXIDE FILM AND METHOD OF FORMING THE SAME, COMPUTER-READABLE STORAGE, AND PLASMA CVD APPARATUS

by NAKANISHI TOSHIO, HONDA MINORU, MIYAHARA JUNYA, KONO MASAYUKI
Year of Publication 15.04.2010

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Deposition method of tungsten film

by MIYAHARA, JUNYA, NASU, MASAYUKI, MARUYAMA, TOMOHISA, MAEKAWA, KOJI, SUZUKI, KENJI, HOTTA, TAKANOBU
Year of Publication 16.03.2018

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PROCESS FOR PRODUCING SILICON NITRIDE FILM, PROCESS FOR PRODUCING SILICON NITRIDE FILM LAMINATE, COMPUTER-READABLE STORAGE MEDIUM, AND PLASMA CVD DEVICE

by NAKANISHI TOSHIO, NISHIDA TATSUO, HONDA MINORU, MIYAHARA JUNYA, KONO MASAYUKI
Year of Publication 12.11.2009

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Plasma treatment method and plasma treatment device

by MIYAHARA, JUNYA, FUJINO, YUTAKA, SHIOZAWA, TOSHIHIKO
Year of Publication 01.10.2013

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Silicon oxide film, method for forming silicon oxide film, and plasma CVD apparatus

by NAKANISHI TOSHIO, HONDA MINORU, MIYAHARA JUNYA, KOHNO MASAYUKI
Year of Publication 31.08.2011

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Method for forming silicon nitride film, method for manufacturing semiconductor memory device, and plasma cvd apparatus

by MIYAHARA, JUNYA, NISHITA, TATSUO, NAKANISHI, TOSHIO, HONDA, MINORU
Year of Publication 01.03.2011

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Silicon dioxide film and process for production thereof, computer-readable storage medium, and plasma cvd device

by MIYAHARA, JUNYA, NAKANISHI, TOSHIO, KOHNO, MASAYUKI, HONDA, MINORU
Year of Publication 16.08.2010

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