Non Topcoat Self-freezing Photoresist for Double Patterning Process
Ito, Koji, Mita, Michihiro, Wakamatsu, Goji, Anno, Yusuke, Fujisawa, Tomohisa, Osaki, Hitoshi, Hoshiko, Kenji, Tanaka, Hiromitsu, Nishimura, Yukio, Sugiura, Makoto, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Published in Journal of Photopolymer Science and Technology (01.01.2010)
Get full text
Journal Article
Freezing Material Development for Double Patterning Process
Kakizawa, Tomohiko, Wakamatsu, Goji, Anno, Yusuke, Hori, Masafumi, Mita, michihiro, Hoshiko, Kenji, Shio, Takeo, Fujiwara, Koichi, Kusumoto, Shiro, Yamaguchi, Yoshikazu, Shimokawa, Tsutomu
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Published in Journal of Photopolymer Science and Technology (01.01.2009)
Get full text
Journal Article
RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT
NEMOTO, Ryuichi, MITA, Michihiro, MIYAKE, Masayuki, HIKAMI, Yuichi, INAMI, Hajime
Year of Publication 10.10.2024
Get full text
Year of Publication 10.10.2024
Patent
RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND PHOTODEGRADABLE BASE
NEMOTO, Ryuichi, MIYAKE, Masayuki, MITA, Michihiro, KIRIYAMA, Kazuya, ABE, Yudai
Year of Publication 05.10.2023
Get full text
Year of Publication 05.10.2023
Patent
RADIATION-SENSITIVE COMPOSITION AND PATTERN FORMATION METHOD
OTSUKA, Noboru, KAWAKAMI, Takanori, NEMOTO, Ryuichi, MIYAKE, Masayuki, MITA, Michihiro, INAMI, Hajime
Year of Publication 23.02.2023
Get full text
Year of Publication 23.02.2023
Patent
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING SAME
YADA YUJI, KAKIZAWA TOMOHIRO, WAKAMATSU GOJI, MITA MICHIHIRO, HORI MASAFUMI, ANNO YUSUKE
Year of Publication 23.06.2011
Get full text
Year of Publication 23.06.2011
Patent
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMATION METHOD
HIEDA KATSUHIKO, YAMAGUCHI YOSHIKAZU, KAKIZAWA TOMOHIRO, FUJIWARA KOUICHI, MITA MICHIHIRO, HORI MASAFUMI
Year of Publication 03.06.2011
Get full text
Year of Publication 03.06.2011
Patent
RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING SAME
KAKIZAWA, TOMOHIRO, HORI, MASAFUMI, MITA, MICHIHIRO, WAKAMATSU, GOJI, ANNO, YUSUKE, YADA, YUJI
Year of Publication 29.04.2010
Get full text
Year of Publication 29.04.2010
Patent