Large area electron scattering effects on SCALPEL mask critical dimension control
Nordquist, K., Resnick, D.J., Ivin, V., Mangat, P., Lu, B., Masnyj, Z., Ainley, E., Dauksher, W.J., Mancini, D., Silakov, M., Minyushkin, D., Vorotnikova, N.
Published in Microelectronic engineering (01.09.2001)
Published in Microelectronic engineering (01.09.2001)
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Journal Article
Large area electron scattering effects on SCALPEL mask critical dimension control
NORDQUIST, K, RESNICK, D. J, MINYUSHKIN, D, VOROTNIKOVA, N, IVIN, V, MANGAT, P, LU, B, MASNYJ, Z, AINLEY, E, DAUKSHER, W. J, MANCINI, D, SILAKOV, M
Published in Microelectronic engineering (2001)
Get full text
Published in Microelectronic engineering (2001)
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