Impact of the Ferroelectric Stack Lamination in Si Doped Hafnium Oxide (HSO) and Hafnium Zirconium Oxide (HZO) Based FeFETs: Toward High-Density Multi-Level Cell and Synaptic Storage
Ali, Tarek, Kühnel, Kati, Olivo, Ricardo, Lehninger, David, Müller, Franz, Lederer, Maximilian, Rudolph, Matthias, Oehler, Sebastian, Mertens, Konstantin, Hoffmann, Raik, Zimmermann, Katrin, Schramm, Philipp, Metzger, Joachim, Binder, Robert, Czernohorsky, Malte, Kämpfe, Thomas, Seidel, Konrad, Müller, Johannes, Van Houdt, Jan, Eng, Lukas M.
Published in Electronic materials (Basel) (01.09.2021)
Published in Electronic materials (Basel) (01.09.2021)
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Journal Article
Impact of the Nonlinear Dielectric Hysteresis Properties of a Charge Trap Layer in a Novel Hybrid High-Speed and Low-Power Ferroelectric or Antiferroelectric HSO/HZO Boosted Charge Trap Memory
Ali, Tarek, Mertens, Konstantin, Olivo, Ricardo, Rudolph, Matthias, Oehler, Sebastian, Kuhnel, Kati, Lehninger, David, Muller, Franz, Hoffmann, Raik, Schramm, Philipp, Biedermann, Kati, Metzger, Joachim, Binder, Robert, Czernohorsky, Malte, Kampfe, Thomas, Muller, Johannes, Seidel, Konrad, Van Houdt, Jan, Eng, Lukas M.
Published in IEEE transactions on electron devices (01.04.2021)
Published in IEEE transactions on electron devices (01.04.2021)
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Journal Article
Ferroelectric HfO2 thin film testing and whole wafer mapping with non-contact corona-Kelvin metrology
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Muller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Ferroelectric HfO 2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology (Phys. Status Solidi A 7∕2017)
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Müller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Ferroelectric HfO 2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Müller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
Tuning Hyrbrid Ferroelectric and Antiferroelectric Stacks for Low Power FeFET and FeRAM Applications by Using Laminated HSO and HZO films
Ali, Tarek, Lehninger, David, Lederer, Maximilian, Li, Songrui, Kühnel, Kati, Mart, Clemens, Mertens, Konstantin, Hoffmann, Raik, Olivo, Ricardo, Emara, Jennifer, Biedermann, Kati, Metzger, Joachim, Binder, Robert, Czernohorsky, Malte, Kämpfe, Thomas, Müller, Johannes, Seidel, Konrad, Eng, Lukas M.
Published in Advanced electronic materials (01.05.2022)
Published in Advanced electronic materials (01.05.2022)
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Journal Article
Ferroelectric HfO2 thin film testing and whole wafer mapping with non‐contact corona‐Kelvin metrology
Marinskiy, Dmitriy, Polakowski, Patrick, Edelman, Piotr, Wilson, Marshall, Lagowski, Jacek, Metzger, Joachim, Binder, Robert, Müller, Johannes
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
Published in Physica status solidi. A, Applications and materials science (01.07.2017)
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Journal Article
The application of low energy ion scattering spectroscopy (LEIS) in sub 28‐nm CMOS technology
Dittmar, Kornelia, Triyoso, Dina H., Erben, Elke, Metzger, Joachim, Binder, Robert, Brongersma, Hidde H., Weisheit, Martin, Engelmann, Hans‐Jürgen
Published in Surface and interface analysis (01.12.2017)
Published in Surface and interface analysis (01.12.2017)
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Journal Article
Value Delivery Architecture Modeling – A New Approach for Business Modeling
Joachim Metzger, Orestis Terzidis, Nicolai Kraemer
Published in Journal of systemics, cybernetics and informatics (01.08.2015)
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Published in Journal of systemics, cybernetics and informatics (01.08.2015)
Journal Article
(Invited) Integration Challenges of Ferroelectric Hafnium Oxide Based Embedded Memory
Müller, Johannes, Polakowski, Patrick, Paul, Jan, Riedel, Stefan, Hoffmann, Raik, Drescher, Maximilian, Slesazeck, Stefan, Müller, Stefan, Mulaosmanovic, Halid, Schröder, Uwe, Mikolajick, Thomas, Flachowsky, Stefan, Erben, Elke, Smith, Elliot, Binder, Robert, Triyoso, Dina, Metzger, Joachim, Kolodinski, Sabine
Published in ECS transactions (09.09.2015)
Published in ECS transactions (09.09.2015)
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Journal Article
AES and Related Techniques for Yield Improvement, Metrology and Development Support of ULSI Circuits Manufactured in ≤ 28nm CMOS Technology
Dittmar, Kornelia, Ohsiek, Susanne, Klein, Christoph, Weisheit, Martin, Lenski, Markus, Erben, Elke, Triyoso, Dina, Binder, Robert, Metzger, Joachim, Hempel, Klaus, Engelmann, Hans-Jürgen
Published in Microscopy and microanalysis (01.08.2014)
Published in Microscopy and microanalysis (01.08.2014)
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Journal Article
STRUCTURES FOR A FERROELECTRIC FIELD-EFFECT TRANSISTOR AND RELATED METHODS
MULAOSMANOVIC, Halid, DÜNKEL, Stefan, METZGER, Joachim, BINDER, Robert, BEYER, Sven
Year of Publication 17.01.2024
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Year of Publication 17.01.2024
Patent
STRUCTURES FOR A FERROELECTRIC FIELD-EFFECT TRANSISTOR AND RELATED METHODS
Dünkel, Stefan, Mulaosmanovic, Halid, Beyer, Sven, Binder, Robert, Metzger, Joachim
Year of Publication 11.01.2024
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Year of Publication 11.01.2024
Patent
From Emergence to Prevalence: 22FDX® Embedded STT-MRAM
Muller, Johannes, Titova, Aleksandra, Yoon, Hongsik, Merbeth, Thomas, Weisheit, Martin, Wolf, Georg, Bharali, Sanjeeb, Pfefferling, Bert, Otani, Yuichi, Shapoval, Tetyana, Cagliani, Alberto, Vajda, Ferenc, Sadeghi, Pedram, Grimm, Christiana Villas-Boas, Krause, Frank, Altendorf, Ines, Congedo, Gabriele, Binder, Robert, Metzger, Joachim, Lajn, Alexander, Langner, Markus, You, Young Seon, Kallensee, Oliver, Naik, Vinayak B., Yamane, Kazutaka, Soss, Steven
Published in 2022 IEEE International Memory Workshop (IMW) (01.05.2022)
Published in 2022 IEEE International Memory Workshop (IMW) (01.05.2022)
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Conference Proceeding
Halbleitervorrichtung mit ferroelektrischem Hafniumoxid und Herstellungsverfahren
Polakowski, Patrick, Mueller, Johannes, Binder, Robert, Triyoso, Dina H, Metzger, Joachim
Year of Publication 25.05.2023
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Year of Publication 25.05.2023
Patent