Search Results - "MEREDITH, JR., WILLIAM A" :: K.UTB vyhledávací portál | TBU Library Retrieval Portal

Sputtering apparatus

Sputtering apparatus

by Crowley Daniel Theodore, Meredith, Jr. William A
Year of Publication 07.11.2017

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Patent

Plasma enhanced chemical vapor deposition (PECVD) source

Plasma enhanced chemical vapor deposition (PECVD) source

by Neal Michelle Lynn, Crowley Daniel Theodore, German John Robert, Morse Patrick Lawrence, Meredith, Jr. William A
Year of Publication 02.08.2016

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Patent

Antireflection coating for a temperature sensitive substrate

Antireflection coating for a temperature sensitive substrate

by Bjornard, Erik J, Meredith, Jr, William A
Year of Publication 01.08.2006

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK, J, MEREDITH, WILLIAM, A., JR
Year of Publication 30.06.2004

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK, J, MEREDITH, WILLIAM A. JR
Year of Publication 11.09.2003

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK J, MEREDITH, WILLIAM A., JR
Year of Publication 07.08.2001

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK, J, MEREDITH, WILLIAM, A., JR
Year of Publication 23.09.1998

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK, J, MEREDITH, WILLIAM, A., JR
Year of Publication 17.09.1997

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK, J, MEREDITH, WILLIAM, A., JR
Year of Publication 09.05.1996

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Patent

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

ANTIREFLECTION COATING FOR A TEMPERATURE SENSITIVE SUBSTRATE

by BJORNARD, ERIK J, MEREDITH, WILLIAM A., JR
Year of Publication 09.05.1996

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Patent

Absorbing dichroic filters

Absorbing dichroic filters

by MEREDITH, WILLIAM A., JR, LEFEBVRE, PAUL M
Year of Publication 13.01.1993

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Patent

Sputtering apparatus

Sputtering apparatus

by MEREDITH, JR. WILLIAM A, CROWLEY DANIEL THEODORE
Year of Publication 02.12.2014

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Patent

SPUTTERING APPARATUS

SPUTTERING APPARATUS

by Crowley Daniel Theodore, German John Robert, Meredith, JR. William A, Morse Patrick Lawrence
Year of Publication 04.08.2016

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Patent

Sputtering apparatus

Sputtering apparatus

by MORSE PATRICK LAWRENCE, MEREDITH, JR. WILLIAM A, CROWLEY DANIEL THEODORE, GERMAN JOHN ROBERT
Year of Publication 12.04.2016

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Patent

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

by MORSE, PATRICK LAWRENCE, GERMAN, JOHN ROBERT, NEAL, MICHELLE LYNN, CROWLEY, DANIEL THEODORE, MEREDITH, JR., WILLIAM A
Year of Publication 25.05.2016

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Patent

DECENTRALIZED PROCESS CONTROLLER

DECENTRALIZED PROCESS CONTROLLER

by MORSE PATRICK LAWRENCE, MEREDITH, JR. WILLIAM A, GERMAN JOHN ROBERT, ROONEY BRIAN
Year of Publication 30.04.2015

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Patent

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

by MORSE, PATRICK LAWRENCE, GERMAN, JOHN ROBERT, NEAL, MICHELLE LYNN, CROWLEY, DANIEL THEODORE, MEREDITH, JR., WILLIAM A
Year of Publication 04.11.2015

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Patent

Plasma enhanced chemical vapor deposition (PECVD) source

Plasma enhanced chemical vapor deposition (PECVD) source

by MORSE PATRICK LAWRENCE, CROWLEY DANIEL THEODORE, NEAL MICHELLE LYNN, GERMAN JOHN ROBERT, MEREDITH JR WILLIAM A
Year of Publication 28.10.2015

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Patent

SPUTTERING APPARATUS

SPUTTERING APPARATUS

by MORSE PATRICK LAWRENCE, MEREDITH, JR. WILLIAM A, CROWLEY DANIEL THEODORE, GERMAN JOHN ROBERT
Year of Publication 04.09.2014

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Patent

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD) SOURCE

by MORSE PATRICK LAWRENCE, MEREDITH, JR. WILLIAM A, CROWLEY DANIEL THEODORE, NEAL MICHELLE LYNN, GERMAN JOHN ROBERT
Year of Publication 03.07.2014

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