Purely intrinsic poly-silicon films for n-i-p solar cells
RATH, J. K, MEILING, H, SCHROPP, R. E. I
Published in Japanese Journal of Applied Physics (01.09.1997)
Published in Japanese Journal of Applied Physics (01.09.1997)
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Journal Article
Enabling manufacturing of sub-10nm generations of integrated circuits with EUV lithography
Yen, Anthony, Meiling, Hans, Benschop, Jos
Published in 2019 Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2019)
Published in 2019 Electron Devices Technology and Manufacturing Conference (EDTM) (01.03.2019)
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Conference Proceeding
EUV Lithography at Threshold of High-Volume Manufacturing
Yen, Anthony, Meiling, Hans, Benschop, Jos
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
Published in 2018 IEEE International Electron Devices Meeting (IEDM) (01.12.2018)
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Conference Proceeding
Progress in EUV optics lifetime expectations
MERTENS, Bas, WEISS, Markus, VAN DE RUNSTRAAT, Annemieke, MOORS, Roel, SPEE, Karel, PLÖGER, Sven, VAN DE KRUIJS, Robbert, MEILING, Hans, KLEIN, Roman, LOUIS, Eric, KURT, Ralph, WEDOWSKI, Marco, TRENKLER, Hans, WOLSCHRIJN, Bas, JANSEN, Rik
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Journal Article
Progress in EUV optics lifetime expectations
Mertens, Bas, Weiss, Markus, Meiling, Hans, Klein, Roman, Louis, Eric, Kurt, Ralph, Wedowski, Marco, Trenkler, Hans, Wolschrijn, Bas, Jansen, Rik, van de Runstraat, Annemieke, Moors, Roel, Spee, Karel, Plöger, Sven, van de Kruijs, Robbert
Published in Microelectronic engineering (01.06.2004)
Published in Microelectronic engineering (01.06.2004)
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Journal Article
Molecular contamination mitigation in EUVL by environmental control
Koster, Norbert, Mertens, Bas, Jansen, Rik, van de Runstraat, Annemieke, Stietz, Frank, Wedowski, Marco, Meiling, Hans, Klein, Roman, Gottwald, Alexander, Scholze, Frank, Visser, Matthieu, Kurt, Ralph, Zalm, Peer, Louis, Eric, Yakshin, Andrey
Published in Microelectronic engineering (01.07.2002)
Published in Microelectronic engineering (01.07.2002)
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Conference Proceeding
LITHOGRAPHIC PROJECTION DEVICE FOR PREVENTING OVER-EXPOSURE CAUSED BY OVER-CLEANING OF OPTICAL COMPONENTS, MANUFACTURING METHOD THEREOF AND DEVICE OBTAINED THEREBY
MOORS JOHANNES HUBERTUS JOSEPHINA, STEVENS LUCAS HENRICUS JOHANNES, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MEILING HANS
Year of Publication 26.06.2004
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Year of Publication 26.06.2004
Patent
MEASURING APPARATUS OF POLLUTION ON SURFACE OF CONSTITUTING UNIT OF LITHOGRAPHY PROJECTION APPARATUS, MEASURING METHOD THEREOF, AND LITHOGRAPHY PROJECTION APPARATUS CONTAINING THE MEASURING APPARATUS TO PREVENT LOSS OF HEATING, REFLECTIVE INDEX AND TRANSPARENCY OF CONSTITUTING UNIT DUE TO POLLUTION
WOLSCHRIJN BASTIAAN THEODOOR, MERTENS BASTIAAN MATTHIAS, MOORS JOHANNES HUBERTUS JOSEPHINA, DUISTERWINKEL ANTONIE ELLERT, STEVENS LUCAS HENRICUS JOHANNES, KURT RALPH, KIEFT ERIK RENE, MEILING HANS, VANBEEK MICHAEL CORNELIS
Year of Publication 31.08.2004
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Year of Publication 31.08.2004
Patent
MASK HANDLING APPARATUS LITHOGRAPHIC PROJECTION APPARATUS DEVICE MANUFACTURING METHOD AND DEVICE MANUFACTURED THEREBY
LOOPSTRA EROK ROELOF, BANINE VADIM YEVGENYEVICH, HAM ERIK LEONARDUS, DONDERS SJOERD NICOLAAS LAMBER, LEENDERS MARTINUS HENDRIKUS ANTONIUS, MEILING HANS, HEERENS GERRIT-JAN, VISSER HUGO MATTHIEU, MOORS JOHANNES HUBERTUS JOSEPH, WERIJ HENRI GERARD CATO
Year of Publication 04.03.2002
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Year of Publication 04.03.2002
Patent
Results from Alpha Demo and an update on the realization of EUV lithography
Harned, Noreen, Meiling, Hans, Mickan, Uwe, Zimmerman, John
Published in 2007 Digest of papers Microprocesses and Nanotechnology (01.11.2007)
Published in 2007 Digest of papers Microprocesses and Nanotechnology (01.11.2007)
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