Intercalated Organic−Inorganic Perovskites Stabilized by Fluoroaryl−Aryl Interactions
Mitzi, David B, Medeiros, David R, Malenfant, Patrick R. L
Published in Inorganic chemistry (22.04.2002)
Published in Inorganic chemistry (22.04.2002)
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Journal Article
Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography
Goldfarb, Dario L., Vyklicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel D., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah Chung, Noda, Kazumi, Tachiban, Seiichiro, Shirai, Shozo
Published in Journal of Photopolymer Science and Technology (01.01.2008)
Published in Journal of Photopolymer Science and Technology (01.01.2008)
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Journal Article
Bilayer Resists for 193 nm Lithography: SSQ and POSS
Ito, Hiroshi, Truong, Hoa D., Burns, Sean D., Pfeiffer, Dirk, Medeiros, David R.
Published in Journal of Photopolymer Science and Technology (2006)
Published in Journal of Photopolymer Science and Technology (2006)
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Journal Article
A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist
Lin, Qinghuang, Steinhäusler, Thomas, Simpson, Logan, Wilder, Michelle, Medeiros, David R, Willson, C. Grant, Havard, Jennifer, Fréchet, Jean M. J
Published in Chemistry of materials (01.08.1997)
Published in Chemistry of materials (01.08.1997)
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Journal Article
Low-Temperature Melt Processing of Organic−Inorganic Hybrid Films
Mitzi, David B., Medeiros, David R., DeHaven, Patrick W.
Published in Chemistry of materials (15.07.2002)
Published in Chemistry of materials (15.07.2002)
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Journal Article
The Photopolymer Science and Technology Award
Goldfarb, Dario L., Vylicky, Libor, Burns, Sean D., Petrillo, Karen, Arnold, John, Lisi, Anthony, Pfeiffer, Dirk, Sanders, Daniel P., Allen, Robert D., Medeiros, David R., Owe-Yang, Dah chung, Noda, Kazumi, Tachibana, Seiichiro, Shirai, Shozo
Published in Journal of Photopolymer Science and Technology (2009)
Published in Journal of Photopolymer Science and Technology (2009)
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Journal Article
Design of Photoresists with Reduced Environmental Impact. 1. Water-Soluble Resists Based on Photo-Cross-Linking of Poly(vinyl alcohol)
Havard, Jennifer M, Shim, Sang-Yeon, Fréchet, Jean M. J, Lin, Qinghuang, Medeiros, David R, Willson, C. Grant, Byers, Jeffrey D
Published in Chemistry of materials (01.03.1999)
Published in Chemistry of materials (01.03.1999)
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Journal Article
Laterally Linked Liquid Crystal Dimers with Electrooptic Properties
Medeiros, David R, Hale, Michael A, Leitko, Jeffrey K, Willson, C. Grant
Published in Chemistry of materials (20.07.1998)
Published in Chemistry of materials (20.07.1998)
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Journal Article
Bilayer Resists for 193 nm Lithography
Ito, Hiroshi, D. Truong, Hoa, D. Burns, Sean, Pfeiffer, Dirk, R. Medeiros, David
Published in Journal of photopolymer science and technology (01.05.2006)
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Published in Journal of photopolymer science and technology (01.05.2006)
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