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Year of Publication 31.05.2005
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Polishing pad for a semiconductor device having a dissolvable substance
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Year of Publication 31.05.2005
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Method of polishing a semiconductor device
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Year of Publication 13.11.2002
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Polymeric polishing pad having continuously regenerated work surface
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Year of Publication 27.08.2002
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Polymeric polishing pad having continuously regenerated work surface
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Year of Publication 27.08.2002
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Year of Publication 27.08.2002
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Year of Publication 15.06.1999
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Polymeric substrate with polymeric microelements
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Year of Publication 09.12.1998
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Year of Publication 01.07.1998
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Polymeric substrate with polymeric microelements
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Year of Publication 18.03.1998
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POLYMERIC SUBSTRATE WITH POLYMERIC MICROELEMENTS
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Year of Publication 26.07.1995
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POLYMERIC SUBSTRATE WITH POLYMERIC MICROELEMENTS
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Year of Publication 07.06.1995
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