POLISHING CLOTH AND POLISHING METHOD
MATSUI YUKITERU, KAWASE AKIFUMI, OTSUKA YOSUKE, EDA HAJIME, KAWASAKI TAKAHIKO
Year of Publication 23.05.2016
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Year of Publication 23.05.2016
Patent
Challenges of CMP technology for 3D memories
Matsui, Yukiteru
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
Published in Proceedings of International Conference on Planarization/CMP Technology 2014 (01.11.2014)
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Conference Proceeding
Effects of Addition of Resin Particles to Ceria-Based Slurry on Pre-Metal Dielectric Planarization
Matsui, Yukiteru, Eda, Hajime, Seta, Satoko, Ono, Takatoshi, Tateyama, Yoshikuni, Nishioka, Takeshi, Yano, Hiroyuki, Masuko, Masabumi
Published in Journal of the Electrochemical Society (01.01.2010)
Published in Journal of the Electrochemical Society (01.01.2010)
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Journal Article
High-Performance CMP Slurry with CeO2/Resin Abrasive for STI Formation
Matsui, Yukiteru, Tateyama, Yoshikuni, Iwade, Kenji, Nishioka, Takeshi, Yano, Hiroyuki
Published in ECS transactions (28.09.2007)
Published in ECS transactions (28.09.2007)
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Journal Article
High Performance Photoresist Planarization Process by CMP with Resin Abrasive for Trench-First Cu/Low-k Dual Damascene Process
Matsui, Yukiteru, Seta, Satoko, Kinoshita, Masako, Tateyama, Yoshikuni, Shigeta, Atsushi, Nishioka, Takeshi, Yano, Hiroyuki, Shida, Hirotaka, Nishimoto, Kazuo, Masuko, Masabumi
Published in Journal of the Electrochemical Society (01.01.2009)
Published in Journal of the Electrochemical Society (01.01.2009)
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Journal Article
POLISHING APPARATUS AND POLISHING METHOD
NAKAMURA, Kohei, SAKASHITA, Mikiya, MATSUI, Yukiteru, GAWASE, Akifumi
Year of Publication 17.02.2022
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Year of Publication 17.02.2022
Patent