Surface analysis of polysilicon gate etching by pulsed-microwave plasma
Matsui, Miyako, Morimoto, Michikazu, Ikeda, Norihiko, Yokogawa, Kenetsu
Published in Japanese Journal of Applied Physics (01.03.2014)
Published in Japanese Journal of Applied Physics (01.03.2014)
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Journal Article
Highly selective Si3N4 etching on Si using pulsed-microwave CH3F/O2/Ar plasma
Morimoto, Michikazu, Matsui, Miyako, Ikeda, Norihiko, Koga, Kazunori, Shiratani, Masaharu
Published in Japanese Journal of Applied Physics (01.11.2023)
Published in Japanese Journal of Applied Physics (01.11.2023)
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Journal Article
Effect of plasma dissociation on fluorocarbon layers formed under C4F8/Ar pulsed plasma for SiO2 etching
Matsui, Miyako, Usui, Tatehito, Ono, Tetsuo
Published in Japanese Journal of Applied Physics (01.06.2017)
Published in Japanese Journal of Applied Physics (01.06.2017)
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Journal Article
Analysis of surface-reaction layers formed by etching Si3N4 with pulsed-microwave plasma
Matsui, Miyako, Morimoto, Michikazu, Ikeda, Norihiko
Published in Japanese Journal of Applied Physics (01.06.2015)
Published in Japanese Journal of Applied Physics (01.06.2015)
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Journal Article
Activation mechanism of ruthenium etching by Cl-based radicals in O 2 /Cl 2 plasma
Imai, Masaya, Matsui, Miyako, Sugano, Ryoko, Shiota, Takashi, Takasaki, Ko-ichi, Miura, Makoto, Ishii, Yohei, Kuwahara, Kenichi
Published in Japanese Journal of Applied Physics (01.07.2023)
Published in Japanese Journal of Applied Physics (01.07.2023)
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Journal Article
플라스마 처리 방법
SHIOTA TAKASHI, TAKASAKI KOICHI, IMAI MASAYA, MATSUI MIYAKO, KUWAHARA KENICHI
Year of Publication 27.12.2023
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Year of Publication 27.12.2023
Patent
PLASMA PROCESSING METHOD
KUWAHARA Kenichi, IMAI Masaya, SHIOTA Takashi, TAKASAKI Koichi, MATSUI Miyako
Year of Publication 21.12.2023
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Year of Publication 21.12.2023
Patent
Role of surface-reaction layer in HBr/fluorocarbon-based plasma with nitrogen addition formed by high-aspect-ratio etching of polycrystalline silicon and SiO2 stacks
Iwase, Taku, Matsui, Miyako, Yokogawa, Kenetsu, Arase, Takao, Mori, Masahito
Published in Japanese Journal of Applied Physics (01.06.2016)
Published in Japanese Journal of Applied Physics (01.06.2016)
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Journal Article
Dry Process
Published in Japanese Journal of Applied Physics
(01.07.2022)
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Journal Article