Search Results - "MATSUBARA,YOSHIHISA" :: K.UTB vyhledávací portál

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SEMICONDUCTOR DEVICE, JOINING METHOD, AND JOINING SYSTEM

by MATSUBARA, Yoshihisa
Year of Publication 25.08.2022

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CONTAMINANT REDUCTION METHOD AND CONTAMINANT REDUCTION DEVICE

by MATSUBARA YOSHIHISA
Year of Publication 13.09.2021

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Regulation of Neurite Outgrowth by Intermittent Irradiation of Visible Light

by Higuchi, Akon, Watanabe, Toru, Matsubara, Yoshihisa, Matsuoka, Yuki, Hayashi, Shizue
Published in The journal of physical chemistry. B (02.06.2005)

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

by MATSUBARA YOSHIHISA
Year of Publication 15.11.2018

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Patent

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

by MATSUBARA YOSHIHISA
Year of Publication 21.12.2017

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기판 처리 방법

by MATSUBARA YOSHIHISA, YAMASHITA YOHEI, TSUTSUMI YOSHIHIRO
Year of Publication 06.02.2024

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Semiconductor Device

by MATSUBARA YOSHIHISA
Year of Publication 21.06.2017

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SEMICONDUCTOR DEVICE

by MATSUBARA YOSHIHISA
Year of Publication 15.06.2017

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SEMICONDUCTOR DEVICE

by MATSUBARA YOSHIHISA
Year of Publication 15.06.2017

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칩 포함 기판 제조 방법 및 기판 처리 장치

by MATSUBARA YOSHIHISA, YAMASHITA YOHEI, TSUTSUMI YOSHIHIRO
Year of Publication 25.09.2023

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JUNCTION SYSTEM AND JUNCTION METHOD

by MATSUBARA YOSHIHISA, NODA KAZUTAKA, MIMURA TAKEYUKI
Year of Publication 19.04.2023

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Patent

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SUBSTRATE PROCESSING METHOD

by TSUTSUMI, Yoshihiro, MATSUBARA, Yoshihisa, YAMASHITA, Yohei
Year of Publication 08.12.2022

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SUBSTRATE PROCESSING METHOD, PLASMA PROCESSING APPARATUS AND SUBSTRATE PROCESSING SYSTEM

by OUCHI KENJI, INATOMI YUICHIRO, MATSUBARA YOSHIHISA, KIKUCHI YUKI
Year of Publication 29.05.2024

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SUBSTRATE PROCESSING METHOD, PLASMA PROCESSING DEVICE, AND SUBSTRATE PROCESSING SYSTEM

by MATSUBARA, Yoshihisa, INATOMI, Yuichiro, OUCHI, Kenji, KIKUCHI, Yuki
Year of Publication 23.05.2024

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METHOD FOR MANUFACTURING CHIP-MOUNTED SUBSTRATE, AND SUBSTRATE PROCESSING DEVICE

by TSUTSUMI, Yoshihiro, MATSUBARA, Yoshihisa, YAMASHITA, Yohei
Year of Publication 04.08.2022

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Application of Fluorinated Amorphous Carbon Thin Films for Low Dielectric Constant Interlayer Dielectrics

by Endo, Kazuhiko, Tatsumi, Toru, Matsubara, Yoshihisa, Horiuchi, Tadahiko
Published in Japanese Journal of Applied Physics (01.04.1998)

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Journal Article

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

by ISHIGAMI TAKASHI, MATSUBARA YOSHIHISA
Year of Publication 04.08.2016

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Patent

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METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

by MATSUBARA YOSHIHISA, YONEZAWA SYUHEI, KAGAWA KOJI, SEKIGUCHI KENJI, TAKEZAWA YOSHIHIRO, SUZUKI DAISUKE
Year of Publication 08.03.2022

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SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD OF THE SAME

by MATSUBARA YOSHIHISA, SHIMADA YASUHIRO, KYOGOKU YOSHITAKA
Year of Publication 05.04.2018

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Effect of bias addition on the gap-filling properties of fluorinated amorphous carbon thin films grown by helicon wave plasma-enhanced chemical vapor deposition

by ENDO, K, TATSUMI, T, MATSUBARA, Y
Published in Japanese Journal of Applied Physics (15.10.1996)

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