Interface properties of ultra-thin HfO2 films grown by atomic layer deposition on SiO2/Si
RENAULT, O, SAMOUR, D, ROUCHON, D, HOLLIGER, Ph, PAPON, A.-M, BLIN, D, MARTHON, S
Published in Thin solid films (20.03.2003)
Published in Thin solid films (20.03.2003)
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Electronics of the SiO2/HfO2 interface by soft X-ray photoemission spectroscopy
Renault, O., Barrett, N.T., Samour, D., Quiais-Marthon, S.
Published in Surface science (20.09.2004)
Published in Surface science (20.09.2004)
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Electrical and physico-chemical characterization of HfO2/SiO2 gate oxide stacks prepared by atomic layer deposition
Damlencourt, J.-F., Renault, O., Samour, D., Papon, A.-M., Leroux, C., Martin, F., Marthon, S., Séméria, M.-N., Garros, X.
Published in Solid-state electronics (01.10.2003)
Published in Solid-state electronics (01.10.2003)
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Angle-resolved XPS study of thin oxides after wet cleaning on Si0.8 Ge0.2 substrates
Martinez, E., Abbadie, A., Renault, O., Cayrefourcq, I., Quiais-Marthon, S.
Published in Surface and interface analysis (01.04.2006)
Published in Surface and interface analysis (01.04.2006)
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X-ray metrology for advanced silicon processes
Wyon, C., Gonchond, J.P., Delille, D., Michallet, A., Royer, J.C., Kwakman, L., Marthon, S.
Published in Applied surface science (31.10.2006)
Published in Applied surface science (31.10.2006)
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In-line monitoring of advanced microelectronic processes using combined X-ray techniques
Wyon, C., Delille, D., Gonchond, J.P., Heider, F., Kwakman, L., Marthon, S., Mazor, I., Michallet, A., Muyard, D., Perino-Gallice, L., Royer, J.C., Tokar, A.
Published in Thin solid films (22.02.2004)
Published in Thin solid films (22.02.2004)
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Conference Proceeding
Silicon wafer cleaning processes and ozone oxide growth as studied by angle-resolved x-ray photoelectron spectroscopy (ARXPS) and ellipsometry
Ermolieff, A., Marthon, S., Rochet, X., Rouchon, D., Renault, O., Michallet, A., Tardif, F.
Published in Surface and interface analysis (01.05.2002)
Published in Surface and interface analysis (01.05.2002)
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X-ray photoemission study of various polyimide cleaning processes before metal deposition
Ermolieff, A., Marthon, S., Granges, H., Piaguet, J., Pierre, F.
Published in Thin solid films (01.03.1994)
Published in Thin solid films (01.03.1994)
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Study of SiO2/Si interface states in MOS devices by surface charge spectroscopy. Application to rapid thermal nitridation of silicon
ERMOLIEFF, A, DELEONIBUS, S, MARTHON, S, BLANCHARD, B, PIAGUET, J
Published in Journal of electron spectroscopy and related phenomena (27.06.1994)
Published in Journal of electron spectroscopy and related phenomena (27.06.1994)
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PECVD silicon oxides as studied by XPS, RBS, ERDA, IRS and ESR
Ermolieff, A., Sindzingre, T., Marthon, S., Martin, P., Pierre, F., Peccoud, L.
Published in Applied surface science (01.03.1993)
Published in Applied surface science (01.03.1993)
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Surface composition analysis of HF vapour cleaned silicon by X-ray photoelectron spectroscopy
Ermolieff, A., Martin, F., Amouroux, A., Marthon, S., Westendorp, J.F.M.
Published in Applied surface science (1991)
Published in Applied surface science (1991)
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Surface composition analysis of HF-vapour-cleaned silicon by X-ray photoelectron spectroscopy
Ermolieff, A, Martin, F, Amouroux, A, Marthon, S, Westendorp, J F M
Published in Semiconductor science and technology (01.02.1991)
Published in Semiconductor science and technology (01.02.1991)
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XPS studies of contamination of reactor and silicon surfaces caused by reactive ion etching
Ermolieff, A, Amouroux, A, Marthon, S, Faviet, J F, Peccoud, L
Published in Semiconductor science and technology (01.04.1991)
Published in Semiconductor science and technology (01.04.1991)
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Journal Article
Angle‐resolved XPS study of thin oxides after wet cleaning on Si 0.8 Ge 0.2 substrates
Martinez, E., Abbadie, A., Renault, O., Cayrefourcq, I., Quiais‐Marthon, S.
Published in Surface and interface analysis (01.04.2006)
Published in Surface and interface analysis (01.04.2006)
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Journal Article
Interface properties of ultra-thin HfO 2 films grown by atomic layer deposition on SiO 2/Si
Renault, O., Samour, D., Rouchon, D., Holliger, Ph, Papon, A.-M., Blin, D., Marthon, S.
Published in Thin solid films (2003)
Published in Thin solid films (2003)
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Enhancement of quartz electrical conductivity by ion implantation
Danel, J.S., Martin, P., Dufour, M., Ermolieff, A., Marthon, S., Pierre, F., Dupuy, M.
Published in 1993 IEEE International Frequency Control Symposium (1993)
Published in 1993 IEEE International Frequency Control Symposium (1993)
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Conference Proceeding
Electronics of the SiO2/HfO2 interface by soft X-ray photoemission spectroscopy
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Conference Proceeding
Electrical and physico-chemical characterization of HfO 2/SiO 2 gate oxide stacks prepared by atomic layer deposition
Damlencourt, J.-F., Renault, O., Samour, D., Papon, A.-M., Leroux, C., Martin, F., Marthon, S., Séméria, M.-N., Garros, X.
Published in Solid-state electronics (2003)
Published in Solid-state electronics (2003)
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