Attenuated embedded phase shift photomask blanks
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Year of Publication 27.12.2005
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Year of Publication 27.12.2005
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Attenuated embedded phase shift photomask blanks
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Year of Publication 27.12.2005
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Year of Publication 27.12.2005
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HIGH SENSITIVITY RESIST COMPOSITION FOR ELECTRON-BASED LITHOGRAPHY
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Year of Publication 30.08.2007
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Attenuated embedded phase shift photomask blanks
Babich, Katherina, Angelopoulos, Marie, Chey, S, Hibbs, Michael, Lang, Robert, Mahorowala, Arpan, Racette, Kenneth
Year of Publication 16.10.2003
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Year of Publication 16.10.2003
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Attenuated embedded phase shift photomask blanks
Babich, Katherina, Angelopoulos, Marie, Chey, S, Hibbs, Michael, Lang, Robert, Mahorowala, Arpan, Racette, Kenneth
Year of Publication 16.10.2003
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Year of Publication 16.10.2003
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Attenuated embedded phase shift photomask blanks
RACETTE KENNETH CHRISTOPHER, BABICH KATHERINA, HIBBS MICHAEL STRAIGHT, LANG ROBERT N, MAHOROWALA ARPAN PRAVIN, ANGELOPOULOS MARIE, CHEY S. JAY
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Year of Publication 27.07.2005
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ANTIREFLECTIVE SILICON-CONTAINING COMPOSITIONS AS HARDMASK LAYER
ARIRAM, ARI, GUARNIERI, C., RICHARD, HUANG, WU-SONG, MOREAU, WAYNE, M, ANGELOPOULOS, MARIE, KWONG, RANEE
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Year of Publication 13.04.2005
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Method of making a packaged radiation sensitive resist film-coated workpiece
Angelopoulos, Marie, Huang, Wu-Song, Kwong, Ranee Wai-Ling, Medeiros, David Robert, Moreau, Wayne Martin, Petrillo, Karen Elizabeth, Wendt, Herman Russell, Magg, Christopher Karl
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Year of Publication 30.01.2007
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Attenuated embedded phase shift photomask blanks
GUARNIERI C. RICHARD, RACETTE KENNETH CHRISTOPHER, HIBBS MICHAEL STRAIGHT, BABICH KATHERINA E, BROOKS CAMERON JAMES, ANGELOPOULOS MARIE, CHEY S. JAY
Year of Publication 22.02.2005
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Year of Publication 22.02.2005
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Attenuated embedded phase shift photomask blanks
Angelopoulos, Marie, Babich, Katherina E, Brooks, Cameron James, Chey, S. Jay, Guarnieri, C. Richard, Hibbs, Michael Straight, Racette, Kenneth Christopher
Year of Publication 22.02.2005
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Year of Publication 22.02.2005
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Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof
Angelopoulos, Marie, Babich, Katherina, Grill, Alfred, Halle, Scott David, Mahorowala, Arpan Pravin, Patel, Vishnubhai Vitthalbhai
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Year of Publication 04.02.2003
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Tunable vapor deposited materials as antireflective coatings, hardmasks and as combined antireflective coating/hardmasks and methods of fabrication thereof and applications thereof
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Year of Publication 04.02.2003
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Year of Publication 04.02.2003
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