Process control for 32 nm imprint masks using variable shape beam pattern generators
Thompson, Ecron, Selinidis, Kosta, Maltabes, John G., Resnick, Douglas J., Sreenivasan, S.V.
Published in Microelectronic engineering (01.04.2009)
Published in Microelectronic engineering (01.04.2009)
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Current overview of commercially available imprint templates and directions for future development
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Defect analysis of roll-to-roll SAIL manufactured flexible display backplanes
Taussig, C., Elder, R. E., Jackson, W. B., Jeans, A., Jam, M., Holland, E., Hao Luo, Maltabes, J., Perlov, C., Trovinger, S., Almanza-Workman, M., Garcia, R. A., HanJun Kim, Ohseung Kwon, Jeffrey, F.
Published in 69th Device Research Conference (01.06.2011)
Published in 69th Device Research Conference (01.06.2011)
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Complete manufacturability of sub-wavelength lithography using optical enhancements
McCallum, Martin, Lucas, Kevin, Kling, Mike, Maltabes, John
Published in Microelectronic engineering (1998)
Published in Microelectronic engineering (1998)
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