Process for self-aligned implantation
JANSEN, PHILIPPE, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, DONATON RICARDO ALVES, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 03.01.2007
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Year of Publication 03.01.2007
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Ätzverfahren für CoSi2-Schichten und Verfahren zur Herstellung von Schottky-Barrieren Detektoren unter Verwendung desselben
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 23.10.2003
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Year of Publication 23.10.2003
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ÄTZVERFAHREN FÜR COSI2-SCHICHTEN UND VERFAHREN ZUR HERSTELLUNG VON SCHOTTKY-BARRIEREN DETEKTOREN UNTER VERWENDUNG DESSELBEN
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 15.02.2003
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Year of Publication 15.02.2003
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Etching process of CoSi2 layers and process for the fabrication of Schottky-barrier detectors using the same
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 15.01.2003
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Year of Publication 15.01.2003
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Etching process of CoSi2 layers
JANSEN PHILIPPE, MAEX KAREN IRMA JOSEF, DONATON RICARDO ALVES, VERBEECK RITA, BAKLANOV MIKHAIL RODIONOVICH, ROOYACKERS RITA, DEFERM LUDO
Year of Publication 03.07.2001
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Year of Publication 03.07.2001
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Etching process of CoSi2 layers
VERBEECK; RITA, ROOYACKERS; RITA, DEFERM; LUDO, BAKLANOV; MIKHAIL RODIONOVICH, MAEX; KAREN IRMA JOSEF, DONATON; RICARDO ALVES, JANSEN; PHILIPPE
Year of Publication 28.11.2000
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Year of Publication 28.11.2000
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Process for self-aligned implantation
JANSEN, PHILIPPE, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, DONATON RICARDO ALVES, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 02.02.2000
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Year of Publication 02.02.2000
Patent
Process for self-aligned implantation
JANSEN, PHILIPPE, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, DONATON RICARDO ALVES, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 16.06.1999
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Year of Publication 16.06.1999
Patent
Etching process of CoSi2 layers
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 16.04.1997
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Year of Publication 16.04.1997
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Etching process of CoSi2 layers
JANSEN, PHILIPPE, DONATON, RICARDO ALVES, BAKLANOV, MIKHAIL RODIONOVICH, DEFERM, LUDO, MAEX, KAREN IRMA JOSEF, ROOYACKERS, RITA, VERBEECK, RITA
Year of Publication 27.12.1996
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Year of Publication 27.12.1996
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