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Simultaneous Measurement of Size and Depth of Each Defect in a Silicon Wafer Using Light Scattering at Two Wavelengths: Principle, Limitation and Applications of Optical Shallow Defect Analyzer
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Published in Japanese Journal of Applied Physics (01.06.1999)
Published in Japanese Journal of Applied Physics (01.06.1999)
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OSAWA Kentaro, SENDA Naoko, MASUYA Akira, IMAI Kazumichi, MAESHIMA Muneo
Year of Publication 20.10.2016
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Year of Publication 20.10.2016
Patent