Engineering a Small HOMO–LUMO Gap and Intramolecular C−H Borylation by Diborene/Anthracene Orbital Intercalation
Wang, Sunewang R., Arrowsmith, Merle, Böhnke, Julian, Braunschweig, Holger, Dellermann, Theresa, Dewhurst, Rian D., Kelch, Hauke, Krummenacher, Ivo, Mattock, James D., Müssig, Jonas H., Thiess, Torsten, Vargas, Alfredo, Zhang, Jiji
Published in Angewandte Chemie International Edition (26.06.2017)
Published in Angewandte Chemie International Edition (26.06.2017)
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Journal Article
Scope of the Thermal Ring‐Expansion Reaction of Boroles with Organoazides
Braunschweig, Holger, Celik, Mehmet Ali, Dellermann, Theresa, Frenking, Gernot, Hammond, Kai, Hupp, Florian, Kelch, Hauke, Krummenacher, Ivo, Lindl, Felix, Mailänder, Lisa, Müssig, Jonas H., Ruppert, Annika
Published in Chemistry : a European journal (12.06.2017)
Published in Chemistry : a European journal (12.06.2017)
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Journal Article
Boranediyl‐ and Diborane(4)‐1,2‐diyl‐Bridged Platinum A‐Frame Complexes
Brunecker, Carina, Müssig, Jonas H., Arrowsmith, Merle, Fantuzzi, Felipe, Stoy, Andreas, Böhnke, Julian, Hofmann, Alexander, Bertermann, Rüdiger, Engels, Bernd, Braunschweig, Holger
Published in Chemistry : a European journal (14.07.2020)
Published in Chemistry : a European journal (14.07.2020)
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Journal Article
Synthesis and characterisation of boranediyl- and diboranediyl-bridged diplatinum A-frame complexes
Brunecker, Carina, Arrowsmith, Merle, Müssig, Jonas H, Böhnke, Julian, Stoy, Andreas, Heß, Merlin, Hofmann, Alexander, Lenczyk, Carsten, Lichtenberg, Crispin, Ramler, Jacqueline, Rempel, Anna, Braunschweig, Holger
Published in Dalton transactions : an international journal of inorganic chemistry (16.03.2021)
Published in Dalton transactions : an international journal of inorganic chemistry (16.03.2021)
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Journal Article
The role of the HfO2―TiN interface in capacitance―voltage nonlinearity of Metal-Insulator-Metal capacitors
WENGER, Ch, LUKOSIUS, M, WEIDNER, G, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Thin solid films (01.10.2009)
Published in Thin solid films (01.10.2009)
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Conference Proceeding
Journal Article
Microscopic model for the nonlinear behavior of high- k metal-insulator-metal capacitors
Wenger, Ch, Lupina, G., Lukosius, M., Seifarth, O., Müssig, H.-J., Pasko, S., Lohe, Ch
Published in Journal of applied physics (15.05.2008)
Published in Journal of applied physics (15.05.2008)
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Journal Article
Investigation of atomic vapour deposited TiN/HfO2/SiO2 gate stacks for MOSFET devices
WENGER, Ch, LUKOSIUS, M, COSTINA, I, SORGE, R, DABROWSKI, J, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Microelectronic engineering (01.08.2008)
Published in Microelectronic engineering (01.08.2008)
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Journal Article
Hf- and Zr-based alkaline earth perovskite dielectrics for memory applications
Łupina, G., Seifarth, O., Kozłowski, G., Dudek, P., Dąbrowski, J., Lippert, G., Müssig, H.-J.
Published in Microelectronic engineering (01.07.2009)
Published in Microelectronic engineering (01.07.2009)
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Journal Article
Conference Proceeding
Pulse-induced low-power resistive switching in HfO2 metal-insulator-metal diodes for nonvolatile memory applications
Walczyk, Ch, Wenger, Ch, Sohal, R., Lukosius, M., Fox, A., Dąbrowski, J., Wolansky, D., Tillack, B., Müssig, H.-J., Schroeder, T.
Published in Journal of applied physics (01.06.2009)
Published in Journal of applied physics (01.06.2009)
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Journal Article
Dielectric properties of single crystalline PrO2(111)/Si(111) heterostructures: Amorphous interface and electrical instabilities
Seifarth, O., Walczyk, Ch, Lupina, G., Dabrowski, J., Zaumseil, P., Weidner, G., Müssig, H.-J., Schroeder, T.
Published in Journal of applied physics (15.11.2009)
Published in Journal of applied physics (15.11.2009)
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Journal Article
Lattice engineering of dielectric heterostructures on Si by isomorphic oxide-on-oxide epitaxy
Schroeder, T., Costina, I., Storck, P., Wilke, A., Seifarth, O., Giussani, A., Müssig, H.-J., Zaumseil, P.
Published in Journal of applied physics (15.04.2008)
Published in Journal of applied physics (15.04.2008)
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Journal Article
Atomic -vapour -deposited HfO2 and Sr4Ta2O9 layers for metal-insulator-metal applications
LUKOSIUS, M, WENGER, Ch, SCHROEDER, T, DABROWSKI, J, SORGE, R, COSTINA, I, MÜSSIG, H.-J, PASKO, S, LOHE, Ch
Published in Microelectronic engineering (01.09.2007)
Published in Microelectronic engineering (01.09.2007)
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Conference Proceeding
Journal Article
Engineering the semiconductor/oxide interaction for stacking twin suppression in single crystalline epitaxial silicon(111)/insulator/Si(111) heterostructures
Schroeder, T, Zaumseil, P, Seifarth, O, Giussani, A, Müssig, H-J, Storck, P, Geiger, D, Lichte, H, Dabrowski, J
Published in New journal of physics (07.11.2008)
Published in New journal of physics (07.11.2008)
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Journal Article
Morphology and Composition of Selected High-k Materials and Their Relevance to Dielectric Properties of Thin Films
Dąbrowski, J., Lippert, G., Oberbeck, L., Schröder, U., Costina, I., Łupina, G., Ratzke, M., Zaumseil, P., Müssig, H.-J.
Published in Journal of the Electrochemical Society (2008)
Published in Journal of the Electrochemical Society (2008)
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Journal Article
Process integration of Pr-based high- k gate dielectrics
Mane, A.U., Wenger, Ch, Lupina, G., Schroeder, T., Lippert, G., Sorge, R., Zaumseil, P., Weidner, G., Dabrowski, J., Müssig, H.-J.
Published in Microelectronic engineering (01.10.2005)
Published in Microelectronic engineering (01.10.2005)
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Journal Article
Praseodymium silicate films on Si(100) for gate dielectric applications: Physical and electrical characterization
Lupina, G., Schroeder, T., Dabrowski, J., Wenger, Ch, Mane, A. U., Müssig, H.-J., Hoffmann, P., Schmeisser, D.
Published in Journal of applied physics (01.06.2006)
Published in Journal of applied physics (01.06.2006)
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Journal Article
On the epitaxy of twin-free cubic (111) praseodymium sesquioxide films on Si(111)
Schroeder, T., Zaumseil, P., Weidner, G., Wenger, Ch, Dabrowski, J., Müssig, H.-J., Storck, P.
Published in Journal of applied physics (01.01.2006)
Published in Journal of applied physics (01.01.2006)
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Journal Article