Search Results - "M' SAAD, HI" :: K.UTB vyhledávací portál

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BARRIER LAYER DEPOSITION USING HDP-CVD

by M. SAAD HI, TRIBULA DANA, CHO, SEON MEE
Year of Publication 25.06.2001

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NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS

by M. SAAD HI, WITTY DEREK R, WANG YAXIN, RIN TSUAN, MANOJU VERAIKARU
Year of Publication 15.06.2001

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METHOD FOR IMPROVING BARRIER LAYER ADHESION TO HDP-FSG THIN FILMS

by MAJOI VERAIKARU, M. SAAD HI, TRIBULA DANA, DESAI SAMEER, MOGHADAM FARHAD
Year of Publication 16.04.2001

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Nitrogen-free dielectric anti-reflective coating and hardmask

by KIM BOK H.,RATHI SUDAH,AHN SANG H.,BENCHER CHRISTOPHER D.,WANG YUXIANG M.,M. SAAD HI,WANG Y. M.,MASADER H.,SILVETTI MARIO D.,FUNG MIGUEL S.,JUNG KEE BUM,ZHU LEI
Year of Publication 22.02.2006

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Stress reduction of SIOC low K film by addition of alkylenes to OMCTS based processes

by SCHMITT FRANCIMAR C.,M. SAAD HI
Year of Publication 19.07.2006

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Stress reduction of SIOC low K films

by SCHMITT FRANCIMAR C.,M. SAAD HI
Year of Publication 05.07.2006

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Memory cell having stressed layers

by YIEH ELLIE, M. SAAD HI, ARGHAVANI REZA
Year of Publication 15.05.2013

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HPD-FSG PROCESS FOR COPPER DAMASCENE INTEGRATED CIRCUITS

by MA WEN, M SAAD HI
Year of Publication 22.02.2002

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BARRIER LAYER DEPOSITION USING HDP-CVD

by CHO SEON-MEE, TRIBULA DANA, M SAAD HI
Year of Publication 27.07.2001

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A method to improve the ashing/wet etch damage resistance and integration stability of low dielectric constant films

by AHN SANG H, M. SAAD HI, DEMOS ALEXANDROS T
Year of Publication 20.03.2013

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Stress reduction of sioc low k films

by SCHMITT, FRANCIMAR C, M' SAAD, HI
Year of Publication 11.06.2010

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Novel air gap integration scheme

by WITTY, DEREK R, XIA, LI-QUN, M' SAAD, HI, KIM, BOK HOEN, DEMOS, ALEXANDROS T
Year of Publication 01.02.2014

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Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ uv cure

by SHEK, MEI-YEE, NGUYEN, VICTOR, WITTY, DEREK R, XIA, LI-QUN, M' SAAD, HI, ROFLOX, ISABELITA, BALSEANU, MIHAELA
Year of Publication 21.12.2014

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Method to deposit functionally graded dielectric films via chemical vapor deposition using viscous precursors

by PADHI DEENESH,PARK SO HYUN,BALASUBRAMANIAN GANESH,ROCHA ALVAREZ JUAN CARLOS,XIA LI QUN,WITTY DEREK R.,M. SAAD HI
Year of Publication 31.10.2007

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High-power dielectric seasoning for stable wafer-to-wafer thickness uniformity of dielectric CVD films

by RAJAGOPALAN NAGARAJAN,XIA LI QUN,BALSEANU MIHAELA,NOWAK THOMAS,SHAH RANJANA,XU HUIWEN,PETERSON CHAD,WITTY DEREK R.,M. SAAD HI
Year of Publication 24.10.2007

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Blocker plate bypass to distribute gases in a chemical vapor deposition system

by BALASUBRAMANIAN GANESH,ROCHA ALVAREZ JUAN CARLOS,CHO TOM K.,RAJ DAEMIAN,PADHI DEENESH,NOWAK THOMAS,KIM BOK HOEN,M. SAAD HI
Year of Publication 27.06.2007

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Post treatment of low K dielectric films

by CUI ZHENJIANG,CHANG JOSEPHINE J.,DEMOS ALEXANDROST.,ARGHAVANI REZA,WITTY DEREK R.,ARMER HELEN R.,DIXIT GIRISH A.,M. SAAD HI
Year of Publication 11.04.2007

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TECHNIQUES PROMOTING ADHESION OF POROUS LOW K FILM TO UNDERLYING BARRIER LAYER

by D'CRUZ LESTER A, M' SAAD HI, AHN, SANG H, ELSHEREF KHALED A, CUI ZHENJIANG, WITTY DEREK R, DEMOS ALEXANDROS T, SCHMITT FRANCIMAR
Year of Publication 12.03.2007

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